Abstract
The requirement of stress analysis and measurement is increasing with the great development of heterogeneous structures and strain engineering in the field of semiconductors. Micro-Raman spectroscopy is an effective method for the measurement of intrinsic stress in semiconductor structures. However, most existing applications of Raman-stress measurement use the classical model established on the (001) crystal plane. A non-negligible error may be introduced when the Raman data are detected on surfaces/cross-sections of different crystal planes. Owing to crystal symmetry, the mechanical, physical and optical parameters of different crystal planes show obvious anisotropy, leading to the Raman-mechanical relationship dissimilarity on the different crystal planes. In this work, a general model of stress measurement on crystalline silicon with an arbitrary crystal plane was presented based on the elastic mechanics, the lattice dynamics and the Raman selection rule. The wavenumber-stress factor that is determined by the proposed method is suitable for the measured crystal plane. Detailed examples for some specific crystal planes were provided and the theoretical results were verified by experiments.
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This work is financially supported by the National Natural Science Foundation of China (Grants 11772223, 11772227, and 61727810).
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Appendix
Appendix
For the Raman measurement on the (001) crystal plane, its SCS can be chosen as \(\varvec {X}_{1}^{\prime}\) = [1 1 0] = [1 0 0]′, \(\varvec {X}_{2}^{\prime}\) = [− 1 1 0] = [0 1 0]′, \(\varvec {X}_{2}^{\prime}\) = [0 0 1] = [0 0 1]′. According to Eq. (1), the rotation matrix A is given by
By substituting matrix A into Eq. (6), the matrix Hε and Hσ are achieved as follows,
Using Eqs. (9) and (17), for the SCS of the C-Si, the compliance coefficient and the phonon deformation potential tensors can be written as
where k11 = p, k12 = q, k44 = r. Suppose that p′ = (p + q)/2+ r and q′ = (p + q)/2− r, then \({k}_{11}^{\prime}\) = \({k}_{22}^{\prime}\) = p′, \({k}_{33}^{\prime}\) = p, \({k}_{12}^{\prime}\) = q′, \({k}_{13}^{\prime}\) = \({k}_{23}^{\prime}\) = q, \({k}_{44}^{\prime}\) = (p − q)/2, and \({k}_{55}^{\prime}\) = \({k}_{66}^{\prime}\) = r.
We assume that the material is subjected to uniaxial stress along \(\varvec {X}_{1}^{\prime}\), which is \(\sigma_{1}^{\prime}\) = σ′ ≠ 0. According to the generalized Hooke’s law, we obtain the strain in the SCS as follows,
Substituting ε′ and K′ into Eq. (15), the secular matrix in the SCS then becomes
and the eigenvalues and the corresponding eigenvectors can be easily obtained as follows
By using Eq. (16),
where ω0 = 520 cm−1, p = − 1.85ω 20 , q = − 2.31ω 20 , r = − 0.71ω 20 , s11 = 7.68 × 10−12 Pa−1, s12 = − 2.14 × 10−12 Pa−1, and s44 = 12.6 × 10−12 Pa−1. Thus, the wavenumber increments Δωj′ are given by
Hence, the Raman tensor Ri′ and its corresponding vector Vi′ in the SCS are given as follows
Since Vi′ ≠ n′k, the Raman tensor R″k corresponding vector n′k is achieved by using Eq. (22) as follows
Using Eq. (23), the Raman intensity of Δωk′ in the SCS are
For the backscattering from the plane surface of (001) crystal plane, the incident light and scattering light are all along the \(\varvec {X}_{3}^{\prime}\) and all the polarization components in \(\varvec {X}_{3}^{\prime}\) are zero. This means that ei3′ = es3′ = 0. Hence, only I3′ is visible (viz. nonzero) no matter the polarization configures of the incident light and scattering light. The Raman-mechanical relationship becomes into Eq. (29).
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Qiu, W., Ma, L., Li, Q. et al. A general metrology of stress on crystalline silicon with random crystal plane by using micro-Raman spectroscopy. Acta Mech. Sin. 34, 1095–1107 (2018). https://doi.org/10.1007/s10409-018-0797-5
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DOI: https://doi.org/10.1007/s10409-018-0797-5