Electrodeposition of chromium from both CrCl2- and CrCl3-containing dimethylformamide (DMF)–water solutions is studied. It is found that the process of chromium deposition from Cr(II)-containing solutions is stable during the whole period of electrolysis, while the rate of electrodeposition from Cr(III)-containing electrolytes gradually decreases. To explain the experimental results, it has been assumed that the film consisting of chromium oxide and hydroxide species is formed in the near-cathode region during electrolysis in Cr(III)-based baths. The physical properties of this film are critical for chromium electrodeposition. It is necessary to maintain the negative potential sufficient for Cr(II)→Cr electroreduction at the electrode-film interface for the sustained chromium plating. Under such conditions, thick (up to 100 μm) Cr–C coatings of good quality can be deposited.
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Here and further, unless otherwise stated, all potentials are given against the standard hydrogen electrode (SHE)
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Kuznetsov, V.V., Pavlov, L.N., Filatova, E.A. et al. Peculiarities of chromium electrodeposition from water − dimethylformamide solutions. J Solid State Electrochem 22, 217–225 (2018). https://doi.org/10.1007/s10008-017-3728-7
- Near-cathode layer
- Incomplete reduction