Abstract
We successfully produced periodic ytterbium (Yb) narrow lines on a substrate using near-resonant laser light and the direct-write atom-lithography technique. The Yb atom is a promising material for nanofabrication using atom optics due to its electrical conductivity, the laser wavelength required for handling the atoms, the vapor pressure of the fabrication process, etc. The 174Yb atoms collimated by Doppler cooling were channeled by the dipole force of an optical standing wave and then deposited onto a substrate. We clearly observed a grating pattern of Yb atoms fabricated on the substrate with a line separation of approximately 200 nm after examining the surface of the substrate with atomic force microscope. This is the first demonstration of nanofabrication using the atom-optical approach with Yb atoms.
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32.80.-t; 32.80.-Pj
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Ohmukai, R., Urabe, S. & Watanabe, M. Atom lithography with ytterbium beam. Appl. Phys. B 77, 415–419 (2003). https://doi.org/10.1007/s00340-003-1281-9
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DOI: https://doi.org/10.1007/s00340-003-1281-9