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Ultraviolet femtosecond pulses: Key technology for sub-micron machining and efficient XUV pulse generation

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Abstract.

A new scheme to increase the extractable energy from a table-top KrF amplifier up to 100 mJ/pulse is presented. Applications of such pulses for micro-machining and for the generation of powerful XUV radiation are demonstrated.

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Authors and Affiliations

  1. Laser-Laboratorium Göttingen, Hans-Adolf-Krebs-Weg 1, 37077 Göttingen, Germany, DE

    P. Simon, J. Bekesi, C. Dölle, J.-H. Klein-Wiele & G. Marowsky

  2. Department of Experimental Physics, University of Szeged, Dom tér 9, 6720 Szeged, Hungary, HU

    S. Szatmari

  3. Institute of Quantum Optics, University of Hannover, Welfengarten 1, 30167 Hannover, Germany, DE

    B. Wellegehausen

Authors
  1. P. Simon
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  2. J. Bekesi
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  3. C. Dölle
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  4. J.-H. Klein-Wiele
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  5. G. Marowsky
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  6. S. Szatmari
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  7. B. Wellegehausen
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Additional information

Received: 14 September 2001 / Revised version: 8 November 2001 / Published online: 20 June 2002

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Simon, P., Bekesi, J., Dölle, C. et al. Ultraviolet femtosecond pulses: Key technology for sub-micron machining and efficient XUV pulse generation. Appl Phys B 74 (Suppl 1), s189–s192 (2002). https://doi.org/10.1007/s00340-002-0875-y

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  • DOI: https://doi.org/10.1007/s00340-002-0875-y

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