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A novel approach for the improvement of electrostatic behaviour of physically doped TFET using plasma formation and shortening of gate electrode with hetero-gate dielectric

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Abstract

This article presents a new device configuration to enhance current drivability and suppress negative conduction (ambipolar conduction) with improved RF characteristics of physically doped TFET. Here, we used a new approach to get excellent electrical characteristics of hetero-dielectric short gate source electrode TFET (HD-SG SE-TFET) by depositing a metal electrode of 5.93 eV work function over the heavily doped source (P+) region. Deposition of metal electrode induces the plasma (thin layer) of holes under the Si/HfO\(_{2}\) interface due to work function difference of metal and semiconductor. Plasma layer of holes is advantageous to increase abruptness as well as decrease the tunneling barrier at source/channel junction for attaining higher tunneling rate of charge carriers (i.e., electrons), which turns into 86.66 times higher ON-state current compared with the conventional physically doped TFET (C-TFET). Along with metal electrode deposition, gate electrode is under-lapped for inducing asymmetrical concentration of charge carriers in the channel region, which is helpful for widening the tunneling barrier width at the drain/channel interface. Consequently, HD-SG SE-TFET shows suppression of ambipolar behavior with reduction in gate-to-drain capacitance which is beneficial for improvement in RF performance. Furthermore, the effectiveness of hetero-gate dielectric concept has been used for improving the RF performance. Furthermore, reliability of C-TFET and proposed structures has been confirmed in term of linearity.

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Acknowledgements

The authors would like to thank the Science and Engineering Research Board, Department of Science and Technology, Government of India (established through an act of parliament) for providing the financial support to carry out this work. This work has been implemented under the Project Implementation of Sigma Delta Modulator Using Nanowire Electrically Doped Hetero-Material Tunnel Field-Effect Transistor (TFET) for Ultra-Low-Power Applications which is funded by this board.

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Authors and Affiliations

  1. PDPM, Indian Institute of Information Technology, Design and Manufacturing, Jabalpur, India

    Deepak Soni, Dheeraj Sharma, Mohd. Aslam & Shivendra Yadav

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  1. Deepak Soni
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  2. Dheeraj Sharma
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  3. Mohd. Aslam
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  4. Shivendra Yadav
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Correspondence to Deepak Soni.

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Soni, D., Sharma, D., Aslam, M. et al. A novel approach for the improvement of electrostatic behaviour of physically doped TFET using plasma formation and shortening of gate electrode with hetero-gate dielectric. Appl. Phys. A 124, 306 (2018). https://doi.org/10.1007/s00339-018-1670-x

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