Abstract
TiO2 films were prepared by pulsed laser deposition using a metallic Ti target in an O2 gas ambient. The microstructure along with optical and photocatalytic properties of the deposited films were systematically studied by changing the deposition parameters and substrates. It was found that TiO2 films having nearly pure anatase phase grew effectively in O2 atmosphere. When the films were fabricated at a substrate temperature of 400°C, their phase structures were greatly affected by the O2 gas pressure, and nearly pure anatase phase with typical (101) and (004) peaks can be obtained under an O2 pressure of 15 Pa. For the deposition at 700°C, the crystal structure of the TiO2 films exhibited a strong anatase (004) peak and was inert to the oxygen pressures. Two modes, namely a substrate-temperature-controlled mode and an oxygen-pressure-controlled mode, were considered for the growth of the anatase TiO2 films under different substrate temperatures. In addition, the optical and photocatalytic properties were found to be sensitive to both the microstructure and grain size of the TiO2 films.
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A.L. Linsebigler, G. Lu, J.T. Yates Jr., Chem. Rev. 95, 735 (1995)
D. Bahnemann, Sol. Energy 77, 445 (2004)
C.G. Granqvist, Adv. Mater. 15, 1789 (2003)
T. Nakamara, T. Ichitsubo, E. Matsubara, A. Muramatsu, N. Sato, H. Takahashi, Acta Mater. 53, 323 (2005)
H. Tada, H. Honda, J. Electrochem. Soc. 142, 3438 (1995)
D. Pamu, M. Ghanashyam Krishna, K.C. James Raju, A.K. Bhatnagar, Solid State Commun. 135, 7 (2005)
J.D. Deloach, G. Scarel, C.R. Aita, J. Appl. Phys. 85, 2377 (1999)
R. Shinohara, T. Yamaki, S. Yamamoto, H. Itoh, K. Asai, J. Mater. Sci. Lett. 21, 967 (2002)
N. Inoue, H. Yuasa, M. Okoshi, Appl. Surf. Sci. 197–198, 393 (2002)
A.K. Sharma, R.K. Thareja, U. Willer, W. Schade, Appl. Surf. Sci. 206, 137 (2003)
J. Kim, S. Lee, H. Im, Appl. Surf. Sci. 151, 6 (1999)
E.F. Rexer, M.P. Joshi, R.L. Deleon, P.N. Prasad, J.F. Garvey, Rev. Sci. Instrum. 66, 3028 (1998)
S. Yamamoto, T. Sumita, Sugiharuto, A. Miyashita, H. Naramoto, Thin Solid Films 401, 88 (2001)
H. Ito, N. Takada, K. Sasaki, Appl. Phys. A 79, 1327 (2004)
D. Luca, J. Optoelectron. Adv. Mater. 7, 625 (2005)
S. Kitazawa, Y. Choi, S. Yamamoto, Vacuum 74, 637 (2004)
S. Kitazawa, Jpn. J. Appl. Phys. 43, 6335 (2004)
T. Yamaki, T. Sumita, S. Yamamoto, A. Miyashita, J. Cryst. Growth 237–239, 574 (2002)
D.G. Chrisey, G.K. Hubler (eds.), Pulsed Laser Deposition of Thin Films (Wiley, New York, 1994)
B. O’Regan, M. Gratzel, Nature 353, 737 (1991)
A. Fujishima, K. Honda, Nature 238, 37 (1972)
D.G. Syarif, A. Miyashita, T. Yamaki, T. Sumita, Y. Choi, H. Itoh, Appl. Surf. Sci. 193, 287 (2002)
X.L. Cheng, S.J. Hu, P. Zeng, T.C. Kuang, G.R. Xie, F. Gao, Surf. Coat. Technol. 201, 5552 (2007)
G. Rothenberger, J. Moser, M. Gratzel, N. Serpone, D.K. Sharma, J. Am. Chem. Soc. 107, 8054 (1985)
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Xu, Y., Shen, M.R. Anatase TiO2 films fabricated by pulsed laser deposition using Ti target. Appl. Phys. A 94, 275–280 (2009). https://doi.org/10.1007/s00339-008-4767-9
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DOI: https://doi.org/10.1007/s00339-008-4767-9