Research on material removal model and processing parameters of cluster magnetorheological finishing with dynamic magnetic fields

  • Jisheng PanEmail author
  • Mingliang Guo
  • Qiusheng YanEmail author
  • Kun Zheng
  • Xiaolan Xiao


Based on fluid mechanics and Preston equation, the influences of various technological parameters (including rotational speeds of workpieces, magnetic poles, and polishing disk and the machining gap) on polishing pressure on workpiece surfaces were investigated. On this basis, a material removal rate (MRR) model of cluster magnetorheological finishing (CMRF) with dynamic magnetic fields was established. Moreover, three pieces of single-crystal silicon substrates were subjected to synchronous polishing on the CMRF devices with dynamic magnetic fields in order to analyze the influence of different technological parameters on the MRR. It is showed that the theoretical simulation results favorably agree with the experimental results. The single-crystal silicon substrates with the initial surface roughness (Ra) of 0.48 μm were polished for 5 h on the optimal technological conditions: the machining gap and the eccentricity of magnetic poles are 0.9 mm and 6 mm, respectively; the workpieces are oscillated in Y direction for 40 mm at the oscillation speed of 600 mm/min; the rotational speeds of the polishing disk, magnetic poles, and workpieces are 50 r/min, 90 r/min, and 350 r/min, respectively. In this way, the super-smooth uniform surfaces with the roughness of Ra 2.4 nm were acquired.


Dynamic magnetic field Cluster magnetorheological finishing Plane polishing Material removal rate model Polishing pressure Single-crystal silicon substrate 


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The authors wish to gratefully acknowledge the help of Dr. Xiaowei Zhang, a visiting fellow of Nagoya University in the final language editing of this paper.

Funding information

This study received funding from the Guangdong Provincial Science and Technology Project (No. 2016A010102014) and the Guangdong Province Natural Science Foundation Project (No. 2015A030311044).


  1. 1.
    Kordonski W, Golini D (1999) Progress update in magnetorheological finishing. Int J Mod Phys B 13:2205–2212. CrossRefGoogle Scholar
  2. 2.
    Ghosh G, Mandal P, Mondal S (2017) Modeling and optimization of surface roughness in keyway milling using ANN, genetic algorithm, and particle swarm optimization. Int J Adv Manuf Technol 2:1–20. Google Scholar
  3. 3.
    Wang Y, Zhang Y, Feng Z (2016) Analyzing and improving surface texture by dual-rotation magnetorheological finishing. Appl Surf Sci 360:224–233. CrossRefGoogle Scholar
  4. 4.
    Sato T, Wu Y, Lin W et al (2009) Study on magnetic compound fluid (MCF) polishing process using fluctuating magnetic field(flow behaviour and applications of complex fluids characterized by non-Newtonian viscosity or functionality). Trans Jpn Soc Mech Eng B 75:1007–1012. CrossRefGoogle Scholar
  5. 5.
    Sidpara A, Jain V (2012) Nanofinishing of freeform surfaces of prosthetic knee joint implant. Proc Inst Mech Eng B J Eng Manuf 226:1833–1846. CrossRefGoogle Scholar
  6. 6.
    Sidpara A, Jain V (2012) Nano–level finishing of single crystal silicon blank using magnetorheological finishing process. Tribol Int 47:159–166. CrossRefGoogle Scholar
  7. 7.
    Singh A, Jha S, Pandey P (2012) Nanofinishing of a typical 3D ferromagnetic workpiece using ball end magnetorheological finishing process. Int J Mach Tools Manuf 63:21–31. CrossRefGoogle Scholar
  8. 8.
    Singh A, Jha S, Pandey P (2013) Mechanism of material removal in ball end magnetorheological finishing process. Wear 302:1180–1191. CrossRefGoogle Scholar
  9. 9.
    Yan Q, Yan J, Lu J (2010) Ultra smooth planarization polishing technique based on the cluster magnetorheological effect. Adv Mater Res 135:18–23. CrossRefGoogle Scholar
  10. 10.
    Pan J, Yan Q, Jiabin L (2014) Cluster magnetorheological effect plane polishing technology. J Mech Eng 50:205. CrossRefGoogle Scholar
  11. 11.
    Pan J, Yu P, Yan Q (2017) An experimental analysis of strontium titanate ceramic substrates polished by magnetorheological finishing with dynamic magnetic fields formed by rotating magnetic poles. Smart Mater Struct 26:055017. CrossRefGoogle Scholar
  12. 12.
    Yu P, Pan J, Yan Q (2016) Magnetorheological finishing with tangential magnetic fields formed by the rotation of a magnetic pole. Int J Adv Abras Technol 7:307. CrossRefGoogle Scholar
  13. 13.
    Kordonski W, Jacobs S (1996) Model of magnetorheological finishing. J Intell Mater Syst Struct 7:131–137. CrossRefGoogle Scholar
  14. 14.
    Kordonski W, Gorodkin S (2011) Material removal in magnetorheological finishing of optics. Appl Opt 50:1984–1994. CrossRefGoogle Scholar
  15. 15.
    Shorey A, Gregg L, Romanofsky H (1999) Study of material removal during magnetorheological finishing. Proc SPIE Int Soc Opt Eng 3782.
  16. 16.
    Jha S, Jain V (2009) Rheological characterization of magnetorheological polishing fluid for MRAFF. Int J Adv Manuf Technol 42:656–668. CrossRefGoogle Scholar
  17. 17.
    Miao C, Shafrir S, Lambropoulos J (2009) Shear stress in magnetorheological finishing for glasses. Appl Opt 48:2585–2594. CrossRefGoogle Scholar
  18. 18.
    Zhang F, Zhang X, Yu J, Wang Q, Guo P (2000) Foundation of mathematics model of magnetorheological finishing. Opt Technol 26:190–192. Google Scholar
  19. 19.
    Pan J, Yan Q (2015) Material removal mechanism of cluster magnetorheological effect in plane polishing. Int J Adv Manuf Technol 81:2017–2026. CrossRefGoogle Scholar
  20. 20.
    Pan J, Yan Q, Gao W, Yu P. (2018) A self-sharpening polishing device with magnetorheological flexible polishing pad formed by dynamic magnetic field and polishing method thereof. Patent, US20180021910A1Google Scholar
  21. 21.
    Sato T, Wu Y, Lin W, Shimada K (2009) Study of three-dimensional polishing using magnetic compound fluid (MCF). Adv Mater Res 76-78:288–293. CrossRefGoogle Scholar
  22. 22.
    Bai Z, Yan Q, Xu X (2015) Experimental investigations into forces acting between cluster MR effect pad and workpiece surface. Chin J Mech Eng 59:190–197. CrossRefGoogle Scholar
  23. 23.
    Tao R (2001) Super-strong magnetorheological fluids. J Phys Condens Matter 13:979–R999. CrossRefGoogle Scholar
  24. 24.
    Degroote J, Marino A, Wilson J (2007) Removal rate model for magnetorheological finishing of glass. Appl Opt 46:7927–7941. CrossRefGoogle Scholar
  25. 25.
    Xiang W, Ling F (2013) Review of coupled research for mechanical dynamics and fluid mechanics of reciprocating compressor. Appl Mech Mater 327:227–232. CrossRefGoogle Scholar
  26. 26.
    Ranjan P (2014) Modelling and simulation of chemo-mechanical magnetorheological finishing (CMMRF) process. Int J Precis Technol 4:230. CrossRefGoogle Scholar
  27. 27.
    Bachovchin K, Hoburg J, Post R (2012) Magnetic fields and forces in permanent magnet levitated bearings. IEEE Trans Magn 48:2112–2120. CrossRefGoogle Scholar

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© Springer-Verlag London Ltd., part of Springer Nature 2018

Authors and Affiliations

  1. 1.School of Electromechanical EngineeringGuangdong University of TechnologyGuangzhouPeople’s Republic of China

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