Summary
Transition metal silicides have attracted attention from the beginning of this century. More recently they have found application as low-resistivity metallization in silicon integrated circuits, leading to a major effort in studying the formation and properties of these silicides. In this paper a brief review of the silicide formation, properties, and applicability in the integrated circuits has been presented.
Similar content being viewed by others
References
A.K. Sinha, J. A. Cooper, Jr., and H. J. Levinstein, IEEE Elec. Dev. Lett. EDL-3, (1982), p. 90.
S. P. Murarka, J. Vac. Sci. Techn. 17, (1980), p. 775.
Y. Nakayama, K. Suyama, H. Shimizu, N. Yokoyama, A. Shibatomi, and H. Ishikawa, in IEEE-ISSCC-1983, Digest of Techn. Papers, IEEE, N.Y. (1982), p. 48.
W. S. Tseng and A. Christou, in “IEEE-IEDM 1982, Technical Digest,” IEEE, N.Y. (1982), p. 174.
N. Yokoyama, T. Ohnishi, K. Odani, H. Onodera, and M. Abe, Trans. Electron Dev. ED-29, (1982), p. 1541.
K. Suyama, H. Shimizu, S. Yokogawa, Y. Nakayama, and A. Shibatomi, Jap. J. Appl. Phys., 22, Supplement 21-1, (1983), p. 341.
S. P. Murarka, Silicides for VLSI Applications, Academic Press, N.Y. (1983).
G. Ottaviani, J. Vac. Sci. Techn. 116, (1979), p. 1112.
S. P. Murarka, M. H. Read, C. J. Doherty, and D. B. Fraser, J. Electrochem. Soc. 129, (1982), p.293.
R. M. Walser and R. W. Bené, Appl. Phys. Lett. 28, (1976), p. 624.
B. Y. Tsaur, S. S. Lau, J. W. Mayer, and M-A. Nicolet, Appl. Phys. Lett. 38, (1981), p. 922.
M P. Lepselter and J. M. Andrews, in Ohmic Contacts to Semiconductors, edited by B. Schwartz, The Electrochemical Soc., Princeton, N.J. 1969, p. 159.
D. B. Fraser and S. P. Murarka, U.S. Patent No. 4,337,476 (1982).
A. K. Shinha, R. B. Marcus, T. T. Sheng, and S. E. Hazko, J. Appl. Phys. 43, (1972), p. 3637.
S. P. Murarka, E. Kinsbron, D. B. Fraser, J. M. Andrews, and E. J. Lloyd, J. Appl. Phys. 54, (1983), p. 6943.
Rights and permissions
About this article
Cite this article
Murarka, S.P. Transition Metal Silicides—Low Resistivity Alternatives for Polysilicon and Metals in Integrated Circuits. JOM 36, 57–60 (1984). https://doi.org/10.1007/BF03338505
Published:
Issue Date:
DOI: https://doi.org/10.1007/BF03338505