Abstract
Nonoxide silicon-based ceramics owe their oxidation resistance to the formation of a thin silica film that separates the ceramic from oxidizing environments. This silica film can be fluxed by alkali oxides to form low-melting alkali silicate corrosion products that do not provide protection. Alkali chlorides and other halides have sufficiently high vapor pressures that silica fluxing can occur without the formation of a condensed halide salt. The rates of oxidation of Si, SiC, and Si3N4 are influenced by the composition of gas mixtures containing these species.
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McNallan, M.J., Hsu, P.P. & Lee, S.Y. Oxidation of Si-based ceramics in the presence of alkali halide vapors. JOM 45, 22–25 (1993). https://doi.org/10.1007/BF03222510
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DOI: https://doi.org/10.1007/BF03222510