Advertisement

JOM

, Volume 43, Issue 1, pp 22–25 | Cite as

Elements of intelligent process control for plasma deposition

  • H. P. Wang
  • E. M. Perry
  • R. D. Lillquist
  • J. H. Taylor
Process Monitoring and Control Overview

Abstract

Induction-coupled plasma deposition (ICPD) is currently a laboratory process relying on operator expertise rather than automated control. Intelligent process control for the ICPD process, which consists of integration of processing knowledge, process models, process sensors and control technology, offers the opportunity to provide closed-loop control as well as intelligent supervisory control to accelerate process development and bring the ICPD process to full-scale production. Intelligent process control for ICPD offers benefits such as higher material quality, control of the matrix micro-structure, cost reduction, higher process yield, and shorter development and production cycle times.

Keywords

Plasma Spray Plasma Torch Reduce Order Model Plasma Plume Plasma Deposition 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    P.A. Parrish and W.G. Barker, “The Basics of the Intelligent Processing of Materials,” JOM, 42(7) (July 1990), pp. 14–16.Google Scholar
  2. 2.
    D. Backman, “Metal-Matrix Composites and IPM: A Modeling Perspective,” JOM, 42(7) (July 1990), pp. 17–20.Google Scholar
  3. 3.
    R.D. Lillquist and C.M. Penny, “Arc-Welding Seam-Tracking Applications Employing Passive Infrared Sensors,” U.S. patent no. 4,477,712 (October 16, 1984).Google Scholar
  4. 4.
    R.D. Lillquist, “Infrared Sensor for Arc-Welding,” U.S. patent no. 4,484,059 (November 20, 1984).Google Scholar
  5. 5.
    R.D. Lillquist, “Imaging Pyrometer,” U.S. patent no. 4,687,344, (August 18, 1987) and Certificate of Correction/April 26, 1988).Google Scholar
  6. 6.
    R.D. Lillquist, R. Lober and R.G. Menzies, “Infrared Sensor for the Control of Plasma Jet Spray Coating Processes and Electric Arc Heating Processes,” U.S. patent no. 4,656,331 (April 7, 1987).Google Scholar
  7. 7.
    H.P. Wang, E.M. Perry and R.D. Lillquist, “Intelligent Processing of Materials for Plasma Deposition,” Symposium M—Plasma Processing and Synthesis of Materials, Materials Research Society, San Francisco, CA (1990).Google Scholar
  8. 8.
    D. Wei, B. Farouk and D. Apelian, “Melting Metal Powder Particles in an Inductively Coupled RF Plasma Torch,” Met. Trans. B, 19B (1988), pp. 213–226.Google Scholar
  9. 9.
    H.P. Wang and E.M. Perry, “A Fast-Acting Process Simulator for Intelligent Plasma Deposition,” Transport Phenomena in Material Processing, HTD-vol. 132, ed. M. Charmichi, M.K. Chyu, Y. Joshi and S.M. Walsh (New York: ASME, 1990), pp. 99–108.Google Scholar
  10. 10.
    D. Backman, E. Russell, D. Wei and Y. Pang, “Intelligent Processing for Metal Matrix Composites,” Intelligent Processing of Materials, ed. H.N.G. Wadley and W.E. Eckhart, Jr. (Warrendale, PA: TMS, 1990), pp. 17–39.Google Scholar

Copyright information

© TMS 1991

Authors and Affiliations

  • H. P. Wang
    • 1
  • E. M. Perry
    • 1
  • R. D. Lillquist
    • 1
  • J. H. Taylor
    • 1
  1. 1.G.E. Corporate Research and DevelopmentSchenectady

Personalised recommendations