Advertisement

Il Nuovo Cimento D

, Volume 20, Issue 7–8, pp 1209–1219 | Cite as

Electro-optic thin films by magnetron sputtering

  • M. Migliuolo
  • T. E. Schlesinger
Article

Summary

We provide a progress report of a continuing collaboration between the Kurt J. Lesker Company, and Carnegie Mellon University. We are developing and transferring an important manufacturing technology from an academic to an industrial environment and are using magnetron sputtering as a reliable technique for the deposition of epitaxial, high-quality electro-optics layers and light-emitting devices. Results are presented for LiNbO3 and Si3N4.

PACS 68.55

Thin film structure and morphology 

PACS 81.15.Cd

Deposition by sputtering 

PACS 42.70

Optical materials 

PACS 85.60

Optoelectronics devices 

PACS 01.30.Ee

Monographs and collections 

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. [1]
    Tan S., Gilbert T., Hung C.-Y., Schlesinger T. E. andMigliuolo M.,J. Appl. Phys.,79 (1996) 3548.CrossRefADSGoogle Scholar
  2. [2]
    Tan S., Schlesinger T. E. andMigliuolo M.,Appl. Phys. Lett.,68 (1996) 2651.CrossRefADSGoogle Scholar
  3. [3]
    Hewig G. H. andJain K.,J. Appl. Phys.,54 (1983) 57.CrossRefADSGoogle Scholar
  4. [4]
    Griffel G., Ruschin S. andCroitoru N.,Appl. Phys. Lett.,54 (1989) 1385.CrossRefADSGoogle Scholar
  5. [5]
    Fujimura N. andIra T.,J. Crystal Growth,115 (1991) 821.CrossRefADSGoogle Scholar
  6. [6]
    Rost T. A., Lin H., Rabson T. A., Baumann R. C. andCallahan D. L.,J. Appl. Phys.,72 (1992) 4336.CrossRefADSGoogle Scholar
  7. [7]
    Huang C. H. J. andRabson T. A.,Opt. Lett.,18 (1993) 811.CrossRefADSGoogle Scholar
  8. [8]
    Tischler J. Z., Budai J. D., Ice G. E. andHabenschuss A.,Acta Cryst. A,44 (1988) 22.CrossRefGoogle Scholar
  9. [9]
    Kaminow I. P. andCarruthers J. R.,Appl. Phys. Lett.,22 (1973) 326.CrossRefADSGoogle Scholar
  10. [10]
    Kolnik J., Ivanco J., Qzvold M., Wyczisk F. andOlivier J.,J. Appl. Phys.,73 (1993) 5075.CrossRefADSGoogle Scholar
  11. [11]
    Svaasand L. O., Eriksrud M., Nakken G. andGrande A. P.,J. Crystal Growth,22 (1974) 230.CrossRefADSGoogle Scholar
  12. [12]
    Tien P. K.,Appl. Opt.,10 (1971) 2395.CrossRefADSGoogle Scholar
  13. [13]
    Rabson T. A., Baumann R. C. andRost T. A.,Ferroelectrics,112 (1990) 265.Google Scholar
  14. [14]
    Serikawa T. andOkamoto A.,J. Electrochem. Soc.,131 (1984) 2928.CrossRefADSGoogle Scholar
  15. [15]
    Qiu X. andGyarmati E.,Thin Solid Films,151 (1987) 223.CrossRefADSGoogle Scholar

Copyright information

© Società Italiana di Fisica 1998

Authors and Affiliations

  • M. Migliuolo
    • 1
  • T. E. Schlesinger
    • 2
  1. 1.Kurt J. Lesker CompanyClairtonUSA
  2. 2.Carnegie Mellon UniversityPittsburghUSA

Personalised recommendations