Magnetic property and interface structure of Ta/NiO/NiFe/Ta
- 22 Downloads
Ta/NiO/NiFe/Ta multilayers, utilizing Ta as buffer layer, were prepared by rf reactive and dc magnetron sputtering. The exchange coupling field between NiO and NiFe reached a maximum value of 9.6 ×103 A/m at a NiO film thickness of 50 nm. The composition and chemical states at interface region of Ta/NiO/Ta were studied by using the Xray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that there is an “intermixing layer” at the Ta/NiO (and NiO/Ta) interface due to a thermodynamically favorable reaction 2Ta + 5NiO = 5Ni + Ta2O5. This interface reaction has a great effect on exchange coupling. The thickness of Ni+NiO estimated by XPS depthprofiles is about 8–10 nm.
KeywordsNiO interface reaction X-ray photoelectron spectroscopy exchange coupling
Unable to display preview. Download preview PDF.
- 10.Wagner, C. D., Riggs, W. M., Davis, L. E. et al., Handbook of Xray Photoelectron Spectroscopy, Minnesota: Perkin-Elmer Corporation, USA, 1979, 81, 144.Google Scholar
- 11.Kubaschewski, O., Alcock, C. B., Spencer, P. J., Materials of Thermochemistry, New York: Pergamon Press, 1993, 300, 312.Google Scholar