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Chinese Science Bulletin

, Volume 46, Issue 5, pp 438–440 | Cite as

Magnetic property and interface structure of Ta/NiO/NiFe/Ta

  • Guanghua Yu
  • Chunlin Chai
  • Fengwu Zhu
  • Jimei Xiao
Notes

Abstract

Ta/NiO/NiFe/Ta multilayers, utilizing Ta as buffer layer, were prepared by rf reactive and dc magnetron sputtering. The exchange coupling field between NiO and NiFe reached a maximum value of 9.6 ×103 A/m at a NiO film thickness of 50 nm. The composition and chemical states at interface region of Ta/NiO/Ta were studied by using the Xray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that there is an “intermixing layer” at the Ta/NiO (and NiO/Ta) interface due to a thermodynamically favorable reaction 2Ta + 5NiO = 5Ni + Ta2O5. This interface reaction has a great effect on exchange coupling. The thickness of Ni+NiO estimated by XPS depthprofiles is about 8–10 nm.

Keywords

NiO interface reaction X-ray photoelectron spectroscopy exchange coupling 

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Copyright information

© Science in China Press 2001

Authors and Affiliations

  • Guanghua Yu
    • 1
  • Chunlin Chai
    • 2
  • Fengwu Zhu
    • 1
  • Jimei Xiao
    • 1
  1. 1.Department of Materials physicsUniversity of Science and TechnologyBeijingChina
  2. 2.Institute of SemiconductorsChinese Academy of SciencesBeijingChina

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