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Energy dispersive X-ray microanalysis of phosphosilicate glasses (PSG)

  • A. L. Tóth
  • J. É. Puskás
Physics of Condensed Matter Short Contributions and Posters Surface Physics

Abstract

EDS peak height ratio method has been used for chemical microanalysis of PSG samples in a scanning electron microscope. We have applied a no-standard inverse ZAF-type correction procedure to calculate working curves as a function of beam energy and take-off angle. With the obtained correction procedure the EDS measurement is fast, precise and accurate compared with other physical techniques. Using this method a proportional relationship has been verified between the PH3/SiH4 ratio of the CVD process and the P concentration of the deposited PSG layer.

Keywords

Polysilicon PIXE Metallization Layer Chemical Vapour Deposit Process Industrial Research Institute 
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Copyright information

© with the authors 1980

Authors and Affiliations

  • A. L. Tóth
    • 1
  • J. É. Puskás
    • 2
  1. 1.Research Institute for Technical PhysicsHungarian Academy of SciencesBudapestHungary
  2. 2.Industrial Research Institute for ElectronicsBudapestHungary

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