Simulation of I–V steps sharpening for Josephson junctions
The effect of rf frequency on the induced I–V steps for Josephson junction is discussed. The resistively shunted junction is applied for the case of an applied rf rectified sinusoidal current in which the amplitude is modulated by a sawtoothed function. It is shown that the step rise sharpens on increasing the rf frequency. We also show that the first fundamental step is nearly absent for low rf frequency while on increasing the rf frequency, the step evolves and assumes its well-known configuration.
KeywordsRiser Josephson Junction Step Width Fundamental Step Versus Step
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- 6.Private communications with Prof. R. Peters, CUA, Washington D.C.Google Scholar