Acta Physica Hungarica

, Volume 62, Issue 1, pp 35–38 | Cite as

Simulation of I–V steps sharpening for Josephson junctions

  • T. F. Refai
  • L. N. Shehata
Condensed Matter


The effect of rf frequency on the induced I–V steps for Josephson junction is discussed. The resistively shunted junction is applied for the case of an applied rf rectified sinusoidal current in which the amplitude is modulated by a sawtoothed function. It is shown that the step rise sharpens on increasing the rf frequency. We also show that the first fundamental step is nearly absent for low rf frequency while on increasing the rf frequency, the step evolves and assumes its well-known configuration.


Riser Josephson Junction Step Width Fundamental Step Versus Step 


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Copyright information

© Akadémiai Kiadó 1987

Authors and Affiliations

  • T. F. Refai
    • 1
  • L. N. Shehata
    • 2
  1. 1.Faculty of Engineering Dept. of Physical and Mathematical EngineeringAin Shams UniversityCairoEgypt
  2. 2.Dept. of Mathematics and Theoretical PhysicsAtomic Energy EstablishmentCairoEgypt

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