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Metals and Materials

, 6:565 | Cite as

Epitaxial deposition of NiO film on a cube-textured Ni substrate by metal-organic chemical vapor deposition

  • Hee-Gyoun Lee
  • Young-Min Lee
  • Hyung-Sik Shin
  • Choong-Hwan Jung
  • Gye-Won Hong
Article

Abstract

NiO films have been epitaxially grown by metal-organic chemical vapor deposition (MOCVD) on a bi-axially textured Ni substrate using Ni(thd)2 as a precursor. The NiO film was deposited at 470°C for 10 min at a deposition pressure of 10 Torr and oxygen partial pressure of 0.91 Torr. SEM and AFM observations for the deposited NiO film showed a smooth and dense morphology. X-ray rocking curve and φ-scan showed that the NiO film has a bi-axial texture with a (100)<001> orientation. The out-of-plane and the in-plane deviations were measured to be 4.2° and 6~7° from the FWHM of (200) and (111) planes, respectively.

Keywords

NiO CVD Ni texture epitaxy 

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Copyright information

© Springer 2000

Authors and Affiliations

  • Hee-Gyoun Lee
    • 1
  • Young-Min Lee
    • 1
  • Hyung-Sik Shin
    • 2
  • Choong-Hwan Jung
    • 1
  • Gye-Won Hong
    • 1
  1. 1.Functional Materials LaboratoryKorea Atomic Energy Research InstituteYusung-ku, TaejonKorea
  2. 2.Department Chemical EngineeringChonbuk National UniversityDeogjin-ku, ChonjuKorea

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