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Plasma-enhanced chemical vapordeposition SiO2 film after ion implantation induces quantum well intermixing

  • Peng Jucun
  • Wu Boying
  • Chen Jie
  • Zhao Jie
  • Wang Yongchen
Article
  • 31 Downloads

Abstract

A method of QWI (quantum well intermixing) realizing through plasma-enhanced chemical vapordeposition (PECVD) SiO2 film following ion implantation was investigated. PECVD 200 nm SiO2 film after 160 keV phosphorus (P) ion implantation was performed to induce InP-based multiple-quantum-well (MQW) laser structural intermixing, annealing process was carried out at 780°C for 30 seconds under N2 flue, the blue shift of photoluminescence (PL) peak related to implanted dose: 1×1011 1×1012, 1×1013, 3×1013, 7×1013 ion/cm2 is 22 nm, 65 nm, 104 nm, 109 nm, 101 nm, respectively. Under the same conditions, by comparing the blue shift of PL peak with P ion implantation only, slight differentiation between the two methods was observed, and results reveal that the defects in the implanting layers generated by ion implantation are much more than those in SiO2 film. So, the blue shift results mainly from ion implantation. However, SiO2 film also may promote the quantum well intermixing.

Key words

quantum well intermixing P ion implantation PECVD SiO2 PL blue shift 

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Copyright information

© Wuhan University of Technology 2006

Authors and Affiliations

  • Peng Jucun
    • 1
  • Wu Boying
    • 1
  • Chen Jie
    • 2
  • Zhao Jie
    • 2
  • Wang Yongchen
    • 2
  1. 1.Department of PhysicsXiaogan UniversityXiaoganChina
  2. 2.Department of PhysicsTianjin Normal UniversityTianjinChina

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