Grain boundary effect on the electrical properties of boron-doped polysilicon films
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The effect of grain boundary width has been accounted for and a modified simple model of average carrier concentration is presented considering the transport mechanism of charge carriers by thermionic emission only. It is found that the electrical properties of polysilicon are very sensitive to doping concentration when the grain size is small and the effect of grain boundary width on electrical properties increases as the grain size decreases. The inclusion of grain boundary width in resistivity and mobility formulae also gives better results near the critical doping concentration. The proposed model gives better agreement between experimental data and theoretical results.
KeywordsGrain boundary electrical properties polysilicon films thermionic emission
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