Advertisement

Bulletin of Materials Science

, Volume 8, Issue 3, pp 423–426 | Cite as

Spray pyrolytic deposition of CuBiS2 thin films

  • S H Pawar
  • A J Pawar
  • P N Bhosale
Proceedings Of The Symposium On Thin Film Science And Technology

Abstract

Thin films of CuBiS2 have been deposited on glass substrates using spray pyrolysis technique. The effect of substrate temperature on the growth of CuBiS2 thin films is studied in the range of 150 to 400°C. The best quality films are grown at substrate temperature 250°C with 0·1 M composition. Other preparative parameters like spray rate, pressure, height of the solution, etc are optimized with respect to substrate temperature. Some optical and electrical properties of CuBiS2 films are also studied and reported.

Keywords

Spray pyrolysis technique ternary chalcogenide films spray rate 

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. Austin I G, Goodman C H L and Pengelly A E 1956Electrochem. Soc. 103 609CrossRefGoogle Scholar
  2. Chamberlin R R and Skarman J S 1966J. Electrochem. Soc. 113 86CrossRefGoogle Scholar
  3. Feigelson R S, N’Dioye A, Yin Shaiw-Yih and Bube R-H 1977J. Appl. Phys. 48 3162CrossRefGoogle Scholar
  4. Mytton R J 1974Solar Energy 16 33CrossRefGoogle Scholar
  5. Pawar S H and Uplane M D 1983Solar Cell 10 177CrossRefGoogle Scholar
  6. Pawar S H, Bhosale P N, Uplane M D and Tamhankar S P 1983Thin Solid Films 110 165CrossRefGoogle Scholar
  7. Pawar S H, Uplane M D, Pawar S K and Desai J S 1985J. Shivaji Univ. Google Scholar
  8. Rajebhosale M R and S H Pawar 1978J. Shivaji Univ. 18 45Google Scholar
  9. Ugai Ya A, Semenov V N and Averbakh E M 1978Izv. Nauk SSIR, Neorgani Cheskie Materialy 14 1529Google Scholar

Copyright information

© the Indian Academy of Sciences 1986

Authors and Affiliations

  • S H Pawar
    • 1
  • A J Pawar
    • 1
  • P N Bhosale
    • 1
  1. 1.Department of PhysicsShivaji UniversityKolhapurIndia

Personalised recommendations