Electron cyclotron resonance heating in a short cylindrical plasma system
- 87 Downloads
Electron cyclotron resonance (ECR) plasma is produced and studied in a small cylindrical system. Microwave power is delivered by a CW magnetron at 2.45 GHz in TE10 mode and launched radially to have extraordinary (X) wave in plasma. The axial magnetic field required for ECR in the system is such that the first two ECR surfaces (B = 875.0 G andB = 437.5 G) reside in the system. ECR plasma is produced with hydrogen with typical plasma density ne as 3.2 × 1010 cm-3 and plasma temperature Te between 9 and 15 eV. Various cut-off and resonance positions are identified in the plasma system. ECR heating (ECRH) of the plasma is observed experimentally. This heating is because of the mode conversion of X-wave to electron Bernstein wave (EBW) at the upper hybrid resonance (UHR) layer. The power mode conversion efficiency is estimated to be 0.85 for this system. The experimental results are presented in this paper.
KeywordsX-wave electron cyclotron resonance upper hybrid resonance
PACS Nos52.35.Hr 52.50.Sw 52.70.Gw
Unable to display preview. Download preview PDF.
- O C Eldridge and A C England,Nucl. Fusion 29, 1583 (1989)Google Scholar
- Wallace M Manheimer, Infrared and millimeter waves, inInstrumentation (Academic Press, New York, 1979) vol. 2, p. 299Google Scholar
- M Porkolab, L Friedland and I B Bernstein,Nucl. Fusion 21, 1643 (1981)Google Scholar
- U Gasparino,Proc. Eighth Joint Workshop ECE and ECRH, IPP III/186,2, 19 (1993)Google Scholar
- T H Stix,Waves in plasmas (American Institute of Physics, New York, 1992) p. 31Google Scholar
- D G Swanson,Theory of mode conversion and tunneling in inhomogeneous plasmas (John Wiley and Sons, Inc., New York, 1998) p. 27Google Scholar
- Francis F Chen, Introduction to plasma physics and controlled fusion, inPlasma Physics (Plenum Press, New York, 1984) vol. 127Google Scholar
- K G Budden,The propagation of radio waves (Cambridge University Press, London, 1985) p. 596Google Scholar
- Noah Hershkowitz, O Auciello and D L Flamm,Plasma diagnostics: Discharge parameters and chemistry (Academic Press Inc., San Diego, USA, 1989) vol. 1, p. 113Google Scholar
- Samuel Y Liao,Microwave devices and circuits (Prentice-Hall of India Pvt. Ltd, New Delhi, 2000) p. 116Google Scholar