Nickel thin films prepared by chemical vapour deposition from nickel acetylacetonate


Nickel thin films were prepared by a low-temperature atmospheric-pressure chemical vapour deposition method. The raw material was nickel acetylacetonate. At a reaction temperature above 250 °C, polycrystalline nickel films can be obtained by hydrogen reduction of the raw material. The resistivity (8.1–13.3 μΩ cm) of the film was close to that of bulk nickel.

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Maruyama, T., Tago, T. Nickel thin films prepared by chemical vapour deposition from nickel acetylacetonate. J Mater Sci 28, 5345–5348 (1993).

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  • Hydrogen
  • Polymer
  • Nickel
  • Thin Film
  • Reaction Temperature