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Chemical vapour deposition of silicon onto iron: influence of silicon vapour phase source on the composition and nature of the coating

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Abstract

Armco iron was siliconized with two different gas mixtures in the temperature range of 750 to 1100 °C. The Ar-SiH4-H2 mixture leads mainly to the formation of a non-porous and adherent solid solution with a maximum silicon content of 6% by weight. For high concentrations of silane in the vapour phase or low treatment temperatures, non adherent pure silicon powder or flakey iron silicides may also depose. The use of Ar-SiH4-SiCl4-H2 mixture leads to the immediate nucleation of Fe3Si, the growth of which occurring from and around the open porosity of the coating. The influence of various parameters such as vapour phase composition and flow rate, hydrogen dilution and treatment temperature, is investigated and analysed in terms of limiting factors of the overall process: gas phase transport, interfacial reactions and diffusion velocity of different species in solid phase.

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Authors and Affiliations

  1. LPCI, Bât. 401, INSA, 69621, Villeurbanne Cedex, France

    C. Klam, J. -P. Millet & H. Mazille

  2. Department of Material Study, EDF, Les Renardières, 77250, Moret-sur-Loing, France

    J. M. Gras

Authors
  1. C. Klam
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  2. J. -P. Millet
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  3. H. Mazille
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  4. J. M. Gras
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Klam, C., Millet, J.P., Mazille, H. et al. Chemical vapour deposition of silicon onto iron: influence of silicon vapour phase source on the composition and nature of the coating. J Mater Sci 26, 4945–4952 (1991). https://doi.org/10.1007/BF00549875

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  • DOI: https://doi.org/10.1007/BF00549875

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