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Electrical properties of thin oxidized aluminium films

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Abstract

Thin aluminium films of thickness 40 to 200 nm were deposited on to glass substrates at 573 K in a high vacuum. The deposition was carried out layer by layer and the interfaces between these layers were exposed to oxygen. The electrical resistivity was studied as a function of the film thickness, annealing time, annealing temperature and oxygen pressure. The temperature coefficient of resistivity and the activation energy for the conduction electrons were studied as a function of the film thickness and oxygen pressure. Fuchs-Sondheimer theory for electrical conduction was applied to the experimental results. The mean free path of the conduction electrons was calculated as a function of temperature and agreed well with the theoretical relation.

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References

  1. A. Mayadas, J. Appl. Phys. 39 (1968) 4241.

    Article  CAS  Google Scholar 

  2. A. Mayadas, F. Feder and R. Rosenberg, J. Vac. Sci. Technol. 6 (1969) 690.

    Article  CAS  Google Scholar 

  3. T. Jayadevaish and R. Kirby, Appl. Phys. Lett. 15 (1969) 150.

    Article  Google Scholar 

  4. J. Reimer, J. Vac. Sci. Technol. A2 (1984) 242.

    Article  Google Scholar 

  5. F. Reicha, Candidate dissertation, Budapest, Hungary (1982).

  6. E. Dobierzewska-Morzrzmyas, P. Bieganski, A. Rados and A. Bochenek, Thin Solid Films 102 (1983) 77.

    Article  Google Scholar 

  7. E. Tochiskii and N. Belyavskii, Phys. Status Solidi (a) 61 (1980) K21.

    Article  Google Scholar 

  8. C. Tellier and A. Tosser, Thin Solid Films 37 (1976) 207.

    Article  CAS  Google Scholar 

  9. P. Desai, H. James and C. Ho, J. Phys. Chem. Ref. Data 13 (1984) 1131.

    Article  CAS  Google Scholar 

  10. R. Simons and R. Balluffi, Phys. Rev. 117 (1960) 62.

    Article  Google Scholar 

  11. R. Seth and S. Woods, ibid. B2 (1970) 2961.

    Article  Google Scholar 

  12. P. Barna and F. Reicha, in Proceedings of 8th International Vacuum Congress, Cannes, September 1980, Vol. 1, SupplE. Vide, Les Couches Minces N201 (1980) p. 165.

  13. Á. Barna, P. Barna, G. Radnoczi, F. Reicha and L. Toth, Phys. Status Solidi (a) 55 (1979) 427.

    Article  CAS  Google Scholar 

  14. M. A. El Hiti, Rev. Physique Appl. 257 (1990) 775.

    Article  Google Scholar 

  15. M. Angadi, J. Mater. Sci. 20 (1985) 761.

    Article  CAS  Google Scholar 

  16. M. El Hiti and M. Ahmed, Phys. Status Solidi (a) 114 (1989) 185.

    Article  Google Scholar 

  17. K. Fuchs, Proc. Camb. Phil. Soc. 34 (1938) 100.

    Article  CAS  Google Scholar 

  18. E. Sondheimer, Adv. Phys. 1 (1952) 1.

    Article  Google Scholar 

  19. C. Kittel, “An Introduction to Solid State Physics”, 3rd Edn (Wiley Eastern Private, New Delhi, 1971) p. 220.

    Google Scholar 

  20. H. Hall, “Solid State Physics” (Wiley, Bristol, England, 1974) p. 233.

    Google Scholar 

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Reicha, F.M., El Hiti, M.A. & Barna, P.B. Electrical properties of thin oxidized aluminium films. J Mater Sci 26, 2007–2014 (1991). https://doi.org/10.1007/BF00549159

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