Abstract
A calorimetric technique was used to measure the plasma enthalpy in a d.c. arcjet diamond deposition system. Using these measurements, and a model based on the assumption of local thermal equilibrium (LTE), the temperature of the plasma emerging from the torch nozzle could be calculated. By controlling the electrical power into the torch, the plasma temperature could be varied from 2900 to 4500 K. This range of plasma temperatures corresponded to a fraction of dissociated H2 (α) which ranged from 0.19 to 0.98. Surprisingly, this variation in the concentration of atomic hydrogen had no effect on the diamond growth rate.
Similar content being viewed by others
References
J. C. Angus, H. A. Will and W. S. Stanko, J. Appl. Phys. 39 (1968) 2915.
D. J. Poferl, N. C. Gardner and J. C. Angus, J. Appl. Phys. 44 (1973) 1428.
R. Messier, A. R. Badzian, T. Badzian, K. E. Spear, P. Bachmann and R. Roy, Thin Solid Films 153 (1987) 1.
D. V. Fedoseev, V. P. Varnin and B. V. Deryagin, Russ. Chem. Rev. 53 (1984) 435.
B. V. Spitsyn and L. L. Bouilov, in “Extended abstracts, diamond and diamondlike materials synthesis”, edited by G. H. Johnson, A. R. Badzian and M. W. Geis (Materials Research Society, Pittsburgh, PA, 1988), p. 3.
B. V. Spitsyn, L. L. Bouilov and B. V. Derjaguin, J. Cryst. Growth 52 (1981) 219.
S. J. Harris, Appl. Phys. Lett. 56 (1990) 2298.
M. Frenklach and K. E. Spear, J. Mater. Res. 3 (1988) 133.
M. Frenklach and H. Wang, Phys. Rev. B 43 (1991) 1520.
D. G. Goodwin, Appl. Phys. Lett. 59 (1991) 277.
P. Deák, J. Giber and H. Oechsner, Surface Sci. 250 (1991) 287.
D. G. Goodwin and G. G. Gavillet, J. Appl Phys. 68 (1990) 6393.
D. G. Goodwin, J. Appl. Phys. 74 (1993) 6888.
M. Frenklach, J. Appl. Phys. 65 (1989) 5142.
J. Harris and A. M. Weiner, J. Appl. Phys. 67 (1990) 6520.
F. G. Celii and J. E. Butler, Appl. Phys. Lett. 54 (1989) 1031.
L. Schäfer and C. P. Klages, Appl. Phys. Lett. 58 (1991) 571.
J. A. Mucha, D. L. Flamm and D. E. Ibbotson, J. Appl. Phys. 65 (1989) 3448.
B. L. Preppernau and T. A. Miller, J. Vac. Sci. Technol. A 8 (1990) 1673.
E. Pfender, M. Boulos and P. Fauchis, in “Plasma technology in metallurgical processing” (Iron and Steel Society, Inc., Warrendale, PA, 1987).
V. Dembovsky, “Plasma metallurgy: the principles” (Elsevier, New York, NY, 1985).
L. D. Landau and E. M. Lifshitz, “Fluid mechanics” (Pergamon Press, Elmsford, NY, 1987).
L. D. Landau and E. M. Lifshitz, “Statistical physics” (Pergamon Press, Elmsford, NY, 1980).
D. A. Russell and P. Taborek, in “Diamond optics IV, Proc. SPIE 1534”, edited by Albert Feldman and Sandor Holly (SPIE, Bellingham, WA, 1991) p. 14.
Y. F. Zhang, D. Dunn-Rankin and P. Taborek, J. Appl Phys. 74 (1993) 6941.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Russell, D.A., Taborek, P. The dependence of diamond growth rate on hydrogen dissociation in a d.c. arcjet plasma. Journal of Materials Science 29, 4683–4685 (1994). https://doi.org/10.1007/BF00356509
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/BF00356509