Simulation of DC Electric Fields on the Layer Structure of PPLP for Butt-Gap Conditions in HVDC MI-PPLP Cable

  • Jae-Sang Hwang
  • Ik-Soo Kwon
  • Bang-Wook Lee
  • Chae-Kyun JungEmail author
Original Article


The electric and thermal properties of HVDC MI-PPLP cable have recently been improved such as dielectric performance and maximum allowable temperature. However, its dc electric field characteristics have not been fully investigated. As a lapped cable, its main insulating material is PPLP, which has a special composition of Kraft-PP film-Kraft. This prevents conventional dc electric field analysis for the bulk type model from being directly applied to HVDC MI-PPLP cable. Therefore, the layer structure should be considered for HVDC MI-PPLP cable. In this paper, we focused on the difference in the dc electric field properties between the bulk and layer type model, which were determined at a steady state and polarity reversal. In order to determine the difference in the number of the butt-gap, single and double butt-gaps were simulated and compared in terms of the butt-gap conditions. Particularly for the double butt-gap, it was possible to investigate the effects of size, position, and formations using dc electric field simulation. Based on the dc electric field analysis, meaningful information about the butt-gap characteristics of HVDC MI-PPLP cables was obtained.


Butt-gap DC electric field analysis HVDC MI-PPLP cables Layer structure 



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Copyright information

© The Korean Institute of Electrical Engineers 2019

Authors and Affiliations

  • Jae-Sang Hwang
    • 1
  • Ik-Soo Kwon
    • 2
  • Bang-Wook Lee
    • 2
  • Chae-Kyun Jung
    • 1
    Email author
  1. 1.Korea Electric Power Corporation (KEPCO) Research InstituteDaejeonSouth Korea
  2. 2.Department of Electrical and Electronics EngineeringHanyang UniversityAnsanSouth Korea

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