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pp 1–8 | Cite as

Effects of Wet Chemical Etching on Scratch Morphology and Laser Damage Resistance of Fused Silica

  • Hui Ye
  • Yaguo LiEmail author
  • Qiao Xu
  • Wei Yang
  • Chen Jiang
Original Paper
  • 15 Downloads

Abstract

Brittle scratches are responsible for the damage ignition when exposed to pulsed UV laser. We investigated the morphology evolution and damage resistance of glass with HF etching. The light intensity around scratches is found to increase with the dimension of scratches. Laser damage tends to be initiated at scratches edge and this is correlated with the peak electrical/light intensification and/or the mechanical weakening due to the chevron-cracks along the scratch. Moreover, the laser-induced damage threshold (LIDT) fluctuates when the length of chevron cracks varied and/or the electric/light intensification factor (LIF) is increased with the size of scratches in chemical etching.

Keywords

Fused silica optics Laser damage Brittle scratches HF-based etching Light distribution Finite difference time domain (FDTD) simulation 

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Notes

Acknowledgements

The damage testing by Mr. Zhichao Liu is thankfully appreciated, and the atomic force microscopy testing by Mr. Huan Yang is also thankfully appreciated. This work was partly supported by National Natural Science Foundation of China (No. 51505444 and 51475310), Science Challenge Project (No. JCKY2016212A506-0503), Outstanding Youth Talents Project (No. 2017-JCJQ-ZQ-024), Shanghai Sailing Program (No. 18YF1417700), Foundation of Key Laboratory for Precision Manufacturing Technology of CAEP (No. ZZ15004), Foundation for Youth Talents of LFRC, CAEP (No. LFRC-PD012).

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Copyright information

© Springer Nature B.V. 2019

Authors and Affiliations

  1. 1.School of Mechanical EngineeringUniversity of Shanghai for Science and TechnologyShanghaiChina
  2. 2.Research Center of Laser FusionChina Academy of Engineering PhysicsMianyangChina
  3. 3.Department of Mechanical and Electrical EngineeringXiamen UniversityXiamenChina

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