Deposition of Organosilicon-Plasma Coating onto Fine Graphite Micropowder with a Downstream Tubular PECVD Reactor
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Fine graphite micropowder was processed in a downstream tubular reactor to perform a fast and homogeneous plasma-enhanced chemical vapor deposition of an organosilicon-plasma coating onto the powder surface. As a single process run results in the deposition of a non-continuous coating, consisting of a nanoparticle distribution, on the powder surface, the powder was repeatedly reprocessed until a continuous coating was obtained. The coating was imaged with focused ion-beam scanning electron microscopy and chemically characterized with Raman spectroscopy and X-ray photoelectron spectroscopy. The assessment of the powder flowability was also performed to investigate the roughness of the coated surface. The chemical characterization indicated that the coating is composed of amorphous hydrogenated silicon carbide with a little oxygen contamination.
KeywordsPECVD Micropowders FIB-SEM XPS
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The Scientific Center for Optical and Electron Microscopy of the ETH Zürich is gratefully acknowledged for providing access to FIB-SEM facility and training. Prof. Dr. Antonella Rossi and Mr. Giovanni Cossu of the Department of Materials of the ETH Zürich are also gratefully acknowledged for providing access to XPS facility, training and technical support, while Dr. Robert Büchel of the Institute of Process Engineering of the ETH Zürich is gratefully acknowledged for providing training on Raman spectroscopy. Financial support comes from the Commission of Technology and Innovation and the Claude & Giuliana Foundation (Switzerland).
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