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Bulletin of Materials Science

, 42:276 | Cite as

A modified high-temperature vapour deposition technique for fabricating \(\hbox {CH}_{3}\hbox {NH}_{3}\hbox {PbI}_{3}\) thin films under an ambient atmosphere

  • G Manobalaji
  • M Pandiyarajan
  • M Senthilkumar
  • S Moorthy BabuEmail author
Article
  • 126 Downloads

Abstract

A modified two-step deposition technique was performed by vapour depositing methylammonium iodide (MAI) on lead iodide \((\hbox {PbI}_{2})\) films to fabricate good quality methylammonium lead iodide (MAPI) thin films under an ambient atmosphere, and their properties were compared with conventional two-step solution processed MAPI thin films. Scanning electron microscopy results depicted that the MAI vapour-processed films have a uniform coverage and planar surface compared with the non-uniformly distributed granule-like morphology of the solution-processed MAPI film. X-ray diffraction results confirm that the vapour-processed films have better crystallinity compared to the conventional solution-processed MAPI thin films. An enhancement in the optical absorption and emission was observed for the vapour-processed films. The higher processing temperature of the modified-vapour deposition eliminates the effect of moisture during the ambient atmosphere processing of the MAPI films.

Keywords

Methylammonium lead iodide two-step deposition methylammonium iodide vapour perovskite solar cells 

Notes

Acknowledgements

The authors sincerely thank the Department of Science and Technology (DST), Government of India, for funding this research No. DST/TM/SERI/FR/90(G).

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Copyright information

© Indian Academy of Sciences 2019

Authors and Affiliations

  • G Manobalaji
    • 1
  • M Pandiyarajan
    • 1
  • M Senthilkumar
    • 1
  • S Moorthy Babu
    • 1
    Email author
  1. 1.Crystal Growth CentreAnna UniversityChennaiIndia

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