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Journal of Failure Analysis and Prevention

, Volume 19, Issue 3, pp 604–607 | Cite as

Product News

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DualBeam Focused Ion Beam Scanning Electron Microscope for Semiconductors Includes New Feedback Systems

Thermo Fisher Scientific, Waltham, Massachusetts, has introduced its latest and most advanced focused ion beam scanning electron microscope for nanometer-scale materials characterization and analysis: the Thermo Scientific Helios 5 DualBeam microscope. The instrument will be available in HX, FX, and UX configurations, which address a broad range of industrial and research challenges. The FX and HX configurations are particularly focused on the needs of semiconductor manufacturers, fabless chip designers, materials researchers, and analytical labs.

The Helios 5 microscope addresses the increasing number of semiconductor technological challenges, including the need to develop products using smaller geometries, 3D structures, new materials, and higher volumes of analytical samples for yield enhancement and root cause analysis.

In comparison with the previous generation, the Helios 5...

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