Journal of Thermal Spray Technology

, Volume 28, Issue 8, pp 1983–1994 | Cite as

Microstructure and Magnetron Sputtering Properties of Molybdenum Target Prepared by Low-Pressure Plasma Spraying

  • Yueming WangEmail author
  • Qiuhao Tang
  • Deqiang Chen
  • Xiubo Liu
  • Xiang Xiong
Peer Reviewed


Planar molybdenum targets were fabricated by low-pressure plasma spraying (LPPS) under 2.6 × 104 Pa pressure. A lamellar structure consisting of vertical columnar grains and compact interlamellar contacts was found in the LPPS deposits. The oxygen content by mass, porosity, average grain size, microhardness, and ultimate tensile strength of the LPPS target were about 0.18%, 1.1%, 0.4 μm, 361.8 HV0.025, and 373.2 MPa, respectively. Electron backscattered diffraction (EBSD) analysis of the LPPS sample showed proportions of <001>-, <011>-, and <111>-oriented grains of about 12.0%, 16.9%, and 9.2% of the total, respectively. The molybdenum target exhibited excellent magnetron sputtering performance, since most of the grains with size less than 1.0 μm were irregularly distributed without preferred orientation. Rapid sputtering and uniform thinning on the surface of LPPS molybdenum targets took place during magnetron sputtering. Smooth and continuous molybdenum thin film with thickness of about 700 nm could be deposited by magnetron sputtering from the LPPS samples. The x-ray diffraction (XRD) spectra of molybdenum thin film with body-centered cubic structure showed that the intensity of (110) diffraction peak was much higher than that of (220) one.


grain orientation low-pressure plasma spray magnetron sputtering mechanical properties molybdenum target thin film 



This work was supported by the Natural Science Foundation of Hunan Province (No. 2016JJ5029, 2019JJ40324), Military and Civilian Integration Industry Development Special Foundation of Hunan Province (No. 2016B116J1), Project National United Engineering Laboratory for Advanced Bearing Tribology (Henan University of Science and Technology, No. 201913), Project Hunan Province Key Laboratory of Materials Surface & Interface Science and Technology (Central South University of Forestry and Technology, No. KFBJM2019002), Project National Engineering Research Center of Near-Net-Shape Forming for Metallic Materials (South China University of Technology, No. 2016003), Project Guangdong Provincial Key Laboratory for Technology and Application of Metal Toughening (Guangdong Institute of Materials and Processing, No. GKL201610), Scientific Research Fund of the Hunan Provincial Education Department (18B408), and National Natural Science Foundation of China (No. 51875051).


  1. 1.
    B.H. Zhao, H.B. Fan, and Y.J. Sun, Molybdenum Sputtering Film and Target for TFT-LCD Manufacture, Chin. Molybden. Indus., 2011, 35(1), p 7-11Google Scholar
  2. 2.
    G. An, J. Li, R.Z. Liu, Q. Chen, and C.L. Zhang, The Application Manufacture and Developing Trend of Molybdenum Sputtering Target, Chin. Molybden. Indus., 2011, 35(2), p 45-48Google Scholar
  3. 3.
    B.C. Yang and H.L. Cui, Manufacture and Application of Sputtering Target Materials, Vacuum, 2001, 38(3), p 11-15Google Scholar
  4. 4.
    Z.Q. Chu, The Present Status and Development Trend of Magnetron Sputtering Target at Home and Abroad, Rare Metal Mater. Eng., 2011, 39(4), p 44-49Google Scholar
  5. 5.
    F. Bai, The Study of Preparing of High Purity Tungsten Alloy Targets, A Dissertation Submitted to Xiamen University for Master Degree of Materials Engineering, Xiamen: Xiamen University, 2015, p40-43.Google Scholar
  6. 6.
    M. Tului, A. Bellucci, A. Albolino, and G. Migliozzi, Zinc Oxide Targets for Magnetron Sputtering PVD Prepared by Plasma Spray, Surf. Coat. Technol., 2010, 205, p 1070-1073CrossRefGoogle Scholar
  7. 7.
    I.V. Driessche, E. Georgiopoulos, J. Denul, A. Tsetsekou, C. Andreouli, I.D. Roeck, G.D. Winter, R.D. Gryse, E. Bruneel, and S. Hoste, Comparison of Plasma Sprayed and Flame Sprayed YBa2Cu3O7–x Targets for Rotatable Magnetron Sputtering, Physica C, 2002, 372–376, p 1221-1224CrossRefGoogle Scholar
  8. 8.
    D. Billieres, and S. S. L. Avignon, Process for Producing a Target by Thermal Spraying, 2012, U.S. Patent 9,156,089.Google Scholar
  9. 9.
    D. Billieres, and S. S. L. Avignon, Molybdenum-Based Target and Process for Producing a Target by Thermal Spraying, 2012, U.S. Patent 9,951,413.Google Scholar
  10. 10.
    Z. J. Zhuang, Preparation of Large-Size Cylindrical Coating Target by Plasma Spraying, 2011, C.N. Patent 201110256260.Google Scholar
  11. 11.
    B. Z. HU, X. Y. Xu, X. N. Liu, H. M. Zhang, Q. H. Zhao, W. W. Ma, J. B. Ma, X. L. Yang, and H. X. Hu, Preparation of Rotary Niobium Oxide Target, 2013, C.N. Patent 201210553666.Google Scholar
  12. 12.
    J. Liang and X.H. Lin, Application of Plasma Spraying Technology in Preparation of Sputtering Targets, Chin. Molybden. Indus., 2014, 38(2), p 43-46Google Scholar
  13. 13.
    A. M. Song, and X. L. Zhong, Preparation of the Tubular Target in Ultra-low Oxygen Levels by Thermal Spraying, 2014, C.N. Patent 201410051665.Google Scholar
  14. 14.
    Y. Gao, Development Tendencies of the Very Low Pressure Plasma Spraying and Deposition Technology, Therm. Spray Technol., 2010, 2(3), p 13-17Google Scholar
  15. 15.
    A.A. Khan, J.C. Labbe, A. Grimaud, and P. Fauchals, Molybdenum and Tungsten Coatings for X-ray Targets Obtained through the Low-Pressure Plasma Spraying Process, J. Therm. Spray Technol., 1997, 6(2), p 228-234CrossRefGoogle Scholar
  16. 16.
    M.J. Kramer, S.C. Okumus, M.F. Besser, O. Unal, and M. Akinc, Microstructure of a Plasma-Sprayed Mo-Si-B Alloy, J. Therm. Spray Technol., 2000, 9(1), p 90-94CrossRefGoogle Scholar
  17. 17.
    T. Murakami and S. Sasaki, Microstructure and Tribological Properties of Fe-Mo Alloy-Coated Steel Specimens Prepared by Low-Pressure Plasma Spraying, Intermetallics, 2011, 19(12), p 1873-1877CrossRefGoogle Scholar
  18. 18.
    L. Pawlowski, The Science and Engineering of Thermal Spray Coatings, Wiley, New York, 1995, p 43-79Google Scholar
  19. 19.
    Y.P. Wan, J.R. Fincke, S. Sampath, V. Prasad, and H. Herman, Modeling and Experimental Observation of Evaporation from Oxidizing Molybdenum Particles Entrained in a Thermal Plasma Jet, Int. J. Heat Mass Transf., 2002, 45(5), p 1007-1015CrossRefGoogle Scholar
  20. 20.
    C.P. Jiang, H. Chen, and J.M. Hao, Property and Oxidize Behavior of Thermal Spraying Mo Coating, Foundry Technol., 2009, 30(7), p 915-917Google Scholar
  21. 21.
    J.J. Tian, S.W. Yao, X.T. Luo, C.X. Li, and C.J. Li, An Effective Approach for Creating Metallurgical Self-bonding in Plasma-Spraying of NiCr-Mo Coating by Designing Shell-Core-Structured Powders, Acta Mater., 2016, 110, p 19-30CrossRefGoogle Scholar
  22. 22.
    Y.J. Lee, H.M. Sung, Y. Jin, K. Lee, C.R. Park, G.H. Kim, and H.N. Han, Improvement of Mechanical Property of Air Plasma Sprayed Tungsten Film Using Pulsed Electric Current Treatment, Int. J. Refract. Met. Hard Mater., 2016, 60, p 99-103CrossRefGoogle Scholar
  23. 23.
    C. Guan, J.J. He, H. Zeng, X.Y. Wan, and Y.J. Li, Microstructure and Texture Evolution of Ultra-high Pure CuMn Alloy Materials, Chin. J. Rare Met., 2017, 41(2), p 120-125Google Scholar
  24. 24.
    H. Fukuyo, I. Sawamura, T. Okabe, T. Ohhashi, and M. Nagasawa, Aluminum or Aluminum Alloy Sputtering Target, 1997, EUR. Patent 0,853,136A1.Google Scholar
  25. 25.
    Y.M. Wang, X. Xiong, L. Xie, X. Xu, X.B. Min, and F. Zheng, Near-net-shape Molybdenum Parts Produced by Plasma Spray Forming, Mater. Trans., 2011, 52(6), p 1269-1275CrossRefGoogle Scholar
  26. 26.
    L. Xie, X. Xiong, Y.M. Wang, X. Xu, and X.B. Min, Molybdenum Products Produced by Plasma Spray Forming and Hot-Isostatic Pressing, J. Cent. South Univ. (Sci. & Tech.), 2011, 42(10), p3009-3014.Google Scholar
  27. 27.
    R.Z. Liu, Y.J. Sun, K.S. Wang, G. An, J. Li, and Y.T. Wang, Influence of Mo Target Microstructure on the Morphology and Properties of Sputtered Films, Rare Metal Mater. Eng., 2012, 41(9), p 1559-1563Google Scholar
  28. 28.
    Y.L. Xu, J.Q. Zhang, and H.Q. Li, Investigation of Hot Isostatic Press Process for Tungsten Target Samples, Atom. Energy Sci. Technol., 2006, 40(6), p 641-645Google Scholar
  29. 29.
    R.Z. Liu, Effect of Molybdenum Plate Rolling Process and Heat Treatment on Sputtering Films’ Microstructure and Property, Mater. Rev. B, 2014, 28(11), p 102-105Google Scholar

Copyright information

© ASM International 2019

Authors and Affiliations

  • Yueming Wang
    • 1
    • 2
    Email author
  • Qiuhao Tang
    • 2
  • Deqiang Chen
    • 3
  • Xiubo Liu
    • 4
  • Xiang Xiong
    • 5
  1. 1.Hunan Provincial Key Laboratory of High Efficiency and Precision Machining of Difficult-to-Cut MaterialHunan University of Science and TechnologyXiangtanChina
  2. 2.Hunan Provincial Key Defense Laboratory of High Temperature Wear-resisting Materials and Preparation TechnologyHunan University of Science and TechnologyXiangtanChina
  3. 3.National United Engineering Laboratory for Advanced Bearing TribologyHenan University of Science and TechnologyLuoyangChina
  4. 4.Hunan Province Key Laboratory of Materials Surface & Interface Science and TechnologyCentral South University of Forestry and TechnologyChangshaChina
  5. 5.State Key Laboratory of Powder MetallurgyCentral South UniversityChangshaChina

Personalised recommendations