Plasma Spray Deposition Enhancement of Titanium Nitride Layer Using Nitrogen-Contained Plasma Irradiation of Titanium Substrate as a Pre-spraying Method
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Reactive plasma spray of TiN ceramic coating attracts much attention over the years because of its ability to deposit thick layers on various metal surfaces. However, some mechanical properties of the coating such as its hardness should be improved. In this study, initially a thin layer of titanium nitride was prepared on a titanium substrate during irradiation of titanium substrate by a thermal DC nitrogen-contained plasma jet. Then, during reactive plasma spraying, Ti particles were injected into plasma jet, converted to titanium nitride and huddled on to the substrate. This new hybrid method (primary plasma irradiation and post-reactive plasma spraying) for deposition of TiN coatings would combine the advantages of both plasma-enhanced chemical vapor deposition and reactive plasma spraying methods in part. It resulted in a thick and hard layer of titanium nitride film. Sample produced by this method was analyzed with x-ray diffraction confirming titanium nitride production. Vickers hardness was measured using optical microscopy which was around 1319 Hv300g. To study the cross section of the layer, optical microscopy and scanning electron microscopy (SEM) were used.
Keywordsthermal plasma spray TiN thin films TiN nanoparticles
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