Impact of Sputtering Power on Properties of CdO:ZnO Thin Films Synthesized by Composite Method for Oxygen Gas Sensing Application
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The present work reports the impact of RF sputtering power on CdO:ZnO (3:1) nanocomposite thin films deposited by sputtering. The structural, morphological, optical and electrical properties of CdO:ZnO thin films deposited at 40 W, 60 W, 80 W and 100 W RF sputtering power were investigated. The structural and morphological results show that high sputtering power improves the crystallinity of thin films. The thin film deposited at 80 W has (111) and (002) phases corresponding to mixed cubic and wurtzite crystal structure, whereas surface morphology of 100 W thin film shows that particles are densely agglomerate. The energy-dispersive x-ray spectrum shows the presence of Cd and Zn atoms in the CdO:ZnO nanocomposite samples. The films show 75–85% transparency in the visible region and a large variation in optical bandgaps from 2.6 eV to 3.5 eV was observed for the samples deposited at 40–100 W with lowest value for the 80 W thin film. I–V characteristics of all the CdO:ZnO thin films show an ohmic nature and resistance varies from 104 Ω to 109 Ω, suitable for resistive based gas sensor. The optimized thin film of CdO:ZnO deposited at 80 W was used for oxygen gas sensing applications 25–200°C operating temperatures and 25.4% sensor response was observed. The response and recovery times were found 10–20 s. Overall study reflects appreciable impact of RF sputtering power on different parameters under investigation.
KeywordsRF sputtering CdO ZnO oxygen sensing
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