Formation of Zr-contained Amorphous Alloy Films by Magnetron Co-sputtering

  • Yuchao Niu (牛玉超)
  • Lingyu Guo
  • Yongtai Zheng
  • Haijian Ma
  • Weimin Wang (王伟民)Email author
Metallic Materials


In order to explore the application of magnetron co-sputtering in fabricating the amorphous alloy, Zr-contained amorphous films were prepared by this technique and investigated by scanning electron microscope, energy disperse spectroscopy and X-ray diffraction. The results show that the co-sputtered films are in fully amorphous state or with amorphous-nanocrystalline structure. The XRD patterns of the Zr-Cu and Zr-Ni amorphous films exhibit a double-peak phenomenon. There is a shift of diffusive peak with changing the sputtering current which is possibly attributed to the change of Zr-Ni and Zr-Cu intermetallic like short range orders. In addition, Zr-Cu-Ni ternary co-sputtered films have a sharper peak at high angle. The sputtering yield of element during co-sputtering ranks as Cu>Ni>Zr, which can be ascribed to the contribution of melting and boiling temperature, atomic size and electrical conductivity of elements.

Key words

amorphous film co-sputtering deposition short-range order 


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The authors are grateful to Prof. Xiaolin Wang from University of Wollongong for his valuable discussions and assistance in the present paper.


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Copyright information

© Wuhan University of Technology and Springer-Verlag GmbH Germany, Part of Springer Nature 2019

Authors and Affiliations

  • Yuchao Niu (牛玉超)
    • 1
  • Lingyu Guo
    • 2
  • Yongtai Zheng
    • 3
  • Haijian Ma
    • 2
  • Weimin Wang (王伟民)
    • 2
    Email author
  1. 1.School of Material Science and EngineeringShandong Jianzhu UniversityJinanChina
  2. 2.School of Material Science and EngineeringShandong UniversityJinanChina
  3. 3.Shandong Yucheng Hanneng Solar Power Co., LtdYuchengChina

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