Advertisement

Plasma Chemistry and Plasma Processing

, Volume 39, Issue 1, pp 187–203 | Cite as

Spatial–Temporal Evolution of a Radial Plasma Jet Array and Its Interaction with Material

  • Ruixue Wang
  • Hui Xu
  • Yong Zhao
  • Weidong Zhu
  • Cheng Zhang
  • Tao ShaoEmail author
Original Paper
  • 94 Downloads

Abstract

This paper investigates the behavior of a radial plasma jet array and its interaction with various cylindrical targets. The jet array comprises six individual plasma jets arranged around a circle at even spaces, directed towards a common central axis, where the cylindrical objects are to be treated. The interaction of the six jets without the target is studied. The effect of pulse rise time on the electrical and optical properties of the plasma jets is investigated. The spatial–temporal evolution of the plasma jet array and its interaction with (1) dielectric target, (2) floating metallic target and (3) grounded metallic target, are studied respectively. It is calculated that the velocity of the ionization front in these three cases, although differs amongst themselves, is in general greater than that in the no-target case. The luminosity and the profile of the ionization wave front are noticeably different in these three cases: comparing to the no-target case, the intensity of the ionization front reduces with the presence of a dielectric target, while the luminosity of the ionization wave front is enhanced with the presence of a metallic target (either floating or grounded). Optical emissions at the quartz nozzle exit and at the central axis are different with different targets. The different behavior of the jet array with the presence of different targets is attributed to the local electric field distribution, which will be discussed in this paper.

Keywords

Radial plasma jet array Ionization wave front Dielectric target Metallic target Optical emission 

Notes

Acknowledgements

This work was supported by the National Natural Science Foundation of China under Contract Nos. 51637010, 51507169, and 11611530681. The authors also want to thanks the supports of State Key Laboratory of Control and Simulation of Power System and Generation Equipments (Tsinghua University) under Contract SKLD17KM06 and Yong Elite Scientists Sponsorship program by CAST (2016QNRC001).

References

  1. 1.
    Kogelschatz U (2003) Plasma Chem Plasma Process 23:1CrossRefGoogle Scholar
  2. 2.
    Shao T, Yang W, Zhang C, Niu Z, Yan P, Schamiloglu E (2014) Appl Phys Lett 105:044102CrossRefGoogle Scholar
  3. 3.
    Cheng H, Lu X, Liu D (2015) Plasma Process Polym 12:1343CrossRefGoogle Scholar
  4. 4.
    Wang R, Gao Y, Zhang C, Yan P, Shao T (2016) IEEE Trans Plasma Sci 44:393CrossRefGoogle Scholar
  5. 5.
    Chen C, Liu D, Yang A, Chen H, Kong MG (2017) Plasma Chem Plasma Process 38:89CrossRefGoogle Scholar
  6. 6.
    Cheng H, Liu X, Lu X, Liu D (2016) High Volt 1:62CrossRefGoogle Scholar
  7. 7.
    Zhang Z, Xu Z, Cheng C, Wei J, Lan Y, Ni G, Sun Q, Qian S, Qian S, Zhang H, Xia W, Shen J, Meng Y, Chu PK (2017) Plasma Chem Plasma Process 37:415CrossRefGoogle Scholar
  8. 8.
    Keidar M, Robert E (2015) Phys Plasmas 11:121901CrossRefGoogle Scholar
  9. 9.
    Bekeschus S, Favia P, Robert E, Woedtke TV (2018) Plasma Process Polym.  https://doi.org/10.1002/ppap.201800033 Google Scholar
  10. 10.
    Duan L, Jiang N, Lu N, Shang K, Li J, Wu Y (2018) Plasma Sci Technol 20:054009CrossRefGoogle Scholar
  11. 11.
    Ostrikov K, Cvelbar U, Murphy AB (2011) J Phys D Appl Phys 44:174001CrossRefGoogle Scholar
  12. 12.
    Mavier F, Zoubian F, Bienia M, Coudert JF, Lejeune M, Rat V, Andre P (2018) Plasma Chem Plasma Process 38:657CrossRefGoogle Scholar
  13. 13.
    Shao T, Wang R, Zhang C, Yan P (2018) High Volt 3:14CrossRefGoogle Scholar
  14. 14.
    Yang Y (2002) Ind Eng Chem Res 41:5918CrossRefGoogle Scholar
  15. 15.
    Wang R, Zhang C, Liu X, Xie Q, Yan P, Shao T (2015) Appl Surf Sci 328:509CrossRefGoogle Scholar
  16. 16.
    Penkov OV, Khadem M, Lim WS, Kim DE (2015) J Coat Technol Res 12:225CrossRefGoogle Scholar
  17. 17.
    Brandenburg R, Bogaerts A, Bongers W, Fridman A, Fridman G, Locke BR, Miller V, Reuter S, Schiorlin M, Verreycken T, Ostrikov K (2018) Plasma Process Polym.  https://doi.org/10.1002/ppap.201700238 Google Scholar
  18. 18.
    Babaeva NY, Kushner MJ (2014) Plasma Sour Sci Technol 23:015007CrossRefGoogle Scholar
  19. 19.
    Wang T, Wang X, Yang B, Chen X, Yang C, Liu J (2017) J Micromech Microeng 27:075005CrossRefGoogle Scholar
  20. 20.
    Zhang P, Wu S, Tan X, Tu Y, Pei X, Gou J, Zhou K, Yang Y (2014) IEEE Trans Plasma Sci 42:2460CrossRefGoogle Scholar
  21. 21.
    Nie Q, Cao Z, Ren C, Wang D, Kong MG (2009) New J Phys 11:115015CrossRefGoogle Scholar
  22. 22.
    Sun P, Chen H, Park S, Eden JG, Liu D, Kong M (2015) J Phys D Appl Phys 48:425203CrossRefGoogle Scholar
  23. 23.
    Robert E, Darny T, Dozias S, Iseni S, Pouvesle (2015) Phys Plasmas 22:122007CrossRefGoogle Scholar
  24. 24.
    Wan F, Liu F, Fang Z, Zhang B, Wan H (2017) Phys Plasmas 24:093514CrossRefGoogle Scholar
  25. 25.
    Ghasemi M, Olszewski P, Bradley JW, Walsh JL (2013) J Phys D Appl Phys 46:052001CrossRefGoogle Scholar
  26. 26.
    Zhou R, Zhang B, Zhou R, Liu F, Fang Z, Ostrikov K (2018) J Appl Phys 124:033301CrossRefGoogle Scholar
  27. 27.
    Wang R, Sun H, Zhu W, Zhang C, Zhang S, Shao T (2017) Phys Plasmas 24:093507CrossRefGoogle Scholar
  28. 28.
    Kim JY, Ballato J, Kim SO (2012) Plasma Process Polym 9:253CrossRefGoogle Scholar
  29. 29.
    Kim JY, Kim SO (2011) IEEE Trans Plasma Sci 39:2278CrossRefGoogle Scholar
  30. 30.
    Ning W, Dai D, Zhang Y, Han Y, Li L (2018) J Phys D Appl Phys 51:125204CrossRefGoogle Scholar
  31. 31.
    Bruggeman PJ, Kushner MJ, Locke BR, Gardeniers JGE, Graham WG et al (2016) Plasma Sour Sci Technol 25:053002CrossRefGoogle Scholar
  32. 32.
    Norberg SA, Johnsen E, Kushner MJ (2016) J Phys D Appl Phys 49:185201CrossRefGoogle Scholar
  33. 33.
    Kovacevic VV, Sretenovic GB, Slikboer E, Guaitella O (2018) J Phys D Appl Phys 51:065202CrossRefGoogle Scholar
  34. 34.
    Ito Y, Fukui Y, Urabe K, Sakai O, Tachibana K (2010) Jpn J Appl Phys 49:066201CrossRefGoogle Scholar
  35. 35.
    Norberg SA, Johnse E, Kushner MJ (2015) J Appl Phys 118:013301CrossRefGoogle Scholar
  36. 36.
    Urabe K, Morita T, Tachibana K, Ganguly BN (2010) J Phys D Appl Phys 43:95201CrossRefGoogle Scholar
  37. 37.
    Riès D, Dilecce G, Robert E, Ambrico PF, Dozias S, Pouvesle JM (2014) J Phys D Appl Phys 47:275401CrossRefGoogle Scholar
  38. 38.
    Darny T, Pouvesle JM, Puech V, Douat C, Dozias S, Robert E (2017) Plasma Sour Sci Technol 26:045008CrossRefGoogle Scholar
  39. 39.
    Wang R, Zhang K, Shen Y, Zhang C, Zhu W, Shao T (2016) Plasma Sour Sci Technol 25:015020CrossRefGoogle Scholar
  40. 40.
    Robert E, Sarron V, Ries D, Dozias S, Vandamme, Pouvesle JM (2012) Plasma Sour Sci Technol 21:034017CrossRefGoogle Scholar
  41. 41.
    Mussard MDVS, Foucher E, Rousseau S (2013) J Phys D Appl Phys 48:302001CrossRefGoogle Scholar
  42. 42.
    Qian M, Li G, Liu S, Zhang Y, Li S, Lin Z, Wang D (2017) Plasma Sci Technol 19:064015CrossRefGoogle Scholar
  43. 43.
    Ye R, Zheng W (2008) Appl Phys Lett 93:071502CrossRefGoogle Scholar
  44. 44.
    Lu X, Laroussi M (2006) J Appl Phys 100:063302CrossRefGoogle Scholar
  45. 45.
    Wang R, Zhang C, Shen Y, Zhu W, Yan P, Shao T, Babaeva NY, Naidis GV (2015) J Appl Phys 118:123303CrossRefGoogle Scholar
  46. 46.
    Guaitella O, Sobota A (2015) J Phys D Appl Phys 48:255202CrossRefGoogle Scholar
  47. 47.
    Boeuf J, Yang L, Pitchford L (2013) J Phys D Appl Phys 46:015201CrossRefGoogle Scholar
  48. 48.
    Zhang B, Zhang G (2017) J Appl Phys 121:105105CrossRefGoogle Scholar
  49. 49.
    Kindersberger J, Lederle C (2008) IEEE Trans Dielectr Electr Insul 15:941CrossRefGoogle Scholar
  50. 50.
    Chen C, Li S, Wu Y, Li Z, Zhang J, Wang Y (2016) Phys Plasmas 23:123501CrossRefGoogle Scholar
  51. 51.
    Xie Q, Lin H, Zhang S, Wang R, Kong F, Shao T (2018) Plasma Sci Technol 20:025504CrossRefGoogle Scholar
  52. 52.
    Wang R, Li W, Zhang C, Ren C, Ostrikov K, Shao T (2017) Plasma Process Polym 14:e1600248CrossRefGoogle Scholar
  53. 53.
    Yi W, Williams P (2002) J Phys D Appl Phys 35:205CrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media, LLC, part of Springer Nature 2018

Authors and Affiliations

  • Ruixue Wang
    • 1
  • Hui Xu
    • 1
  • Yong Zhao
    • 1
  • Weidong Zhu
    • 3
  • Cheng Zhang
    • 1
    • 2
  • Tao Shao
    • 1
    • 2
    Email author
  1. 1.Institute of Electrical EngineeringChinese Academy of SciencesBeijingChina
  2. 2.University of Chinese Academy of SciencesBeijingChina
  3. 3.Department of Applied Science and TechnologySaint Peter’s UniversityJersey CityUSA

Personalised recommendations