Role of cetyltrimethyl ammonium bromide on sol–gel preparation of porous cerium titanate photocatalyst
- 69 Downloads
Cetyltrimethyl ammonium bromide (CTAB) was used as template agent to prepare porous cerium titanate by sol–gel method. Besides major brannerite CeTi2O6 in monoclinic system, the addition of CTAB template leads to formation of minor anatase TiO2 and CeO2 phases. FT-Far-IR spectra also prove Ce-O and Ti-O-Ti bonds in the porous cerium titanate. The addition of CTAB template in the precursor can obviously enlarge BET surface area and pore volume of cerium titanate. Removal of CTAB template during calcination leaves mesoporous structure in the cerium titanate samples, which are presented in the N2 adsorption-desorption isotherms. Not only more hydroxyl radicals can be produced on the samples obtained using CTAB, but also photocatalytic oxidation efficiency is strongly influenced by the variation of CTAB amount. The reaction rate constant is 2.44 × 10−2 min-1 on the porous cerium titanate sample obtained using 2 g CTAB, while the reaction rate constant is only 9.60 × 10−3 min-1 on the sample without CTAB. UV-Visible spectra of ofloxacin solution during photocatalytic oxidation demonstrate the degradation of typical organic groups in ofloxacin molecule.
CTAB was used as template agent to prepare porous cerium titanate by sol–gel method.
CTAB can introduce porous structure and enhance surface area of cerium titanate.
The addition of CTAB may cause production of TiO2 and CeO2.
More hydroxyl radicals can be produced on the samples using CTAB as template.
Photocatalytic oxidation efficiency is strongly affected by the variation of CTAB dosage.
KeywordsCerium titanate Photocatalysis Cetyltrimethyl ammonium bromide Ofloxacin Degradation
This work was supported by National Natural Science Foundation of China (No. 51672119, 51474125).
Compliance with ethical standards
Conflict of interest
The authors declare that they have no conflict of interest.
- 10.Zhang W, Li C, Ma Z, Yang L, He H (2016) J Adv Oxid Technol 19:119–124Google Scholar
- 22.Wang H, Du L, Yang L, Zhang W, He H (2016) J Adv Oxid Technol 19:366–371Google Scholar
- 26.Kong L, Gregg DJ, Karatchevtseva I, Zhang Z, Blackford MG, Middleburgh SC, Lumpkin GR, Triani G (2014) Cheminform 45:6761–6768Google Scholar