The evolution of MoS2 properties under oxygen plasma treatment and its application in MoS2 based devices
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CVD molybdenum disulfide (MoS2) is shown to chemically oxidize rapidly after pure oxygen plasma bombardment. Atomic force microscopy (AFM), photoluminescence spectrum (PL), Raman spectrum and X-ray photoelectron spectroscopy (XPS) are employed to characterize the physical and chemical properties and indicate that MoO3 is easily formed from MoS2. The result of AFM shows that thickness of the film increases from 0.9 to 1.79 nm after oxygen plasma treatment, which is mainly due to the difference in lattice structure between pristine MoS2 and generated MoO3. XPS analysis shows that the intensity of the S2s peak is reduced to 0 after oxygen plasma treatment. Also, the intensities of Mo4+ peaks disappear at 233.2 eV and 230 eV, leaving only the Mo6+ peaks at 232.5 eV and 235.65 eV, which strongly proves the transformation of MoS2 to MoO3. Further, we use oxygen plasma to treat few-layer MoS2, and find that the top oxidized layer can protect the lower MoS2 from further oxidation. Finally, we obtain p-type doped transistors with this method.
This work was supported by the NSFC (Grant No. 61774168), the MOST of China (Grant No. 2016YFA0202300), NSFC (No. 11764008) and Technology Talent Support Project of Department of Education in Guizhou Province (No. KY 045).
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