Effects of annealing process and the additive on the electrical properties of chemical solution deposition derived 0.65Pb(Mg1/3Nb2/3)O3–0.35PbTiO3 thin films
0.65Pb(Mg1/3Nb2/3)O3–0.35PbTiO3 (PMN–PT) thin films were deposited on (111)Pt/Ti/SiO2/Si substrates via the chemical solution deposition. Both of the annealing process and additive methanamide play an obvious part in the structure and electrical properties of PMN–PT films. The optimized high-qualitied PMN–PT thin film in present work is fabricated with the methanamide in the precursor and annealed at 650 °C for 20 min. The film exhibits pure perovskite phase and superior ferroelectricity. The saturation polarization Ps and remanent polarization Pr are 52.1 µC/cm2 and 18.7 µC/cm2 at 500 kV/cm with 1000 Hz. It also shows low leakage current density of approximately 1.0 × 10− 8 A/cm2 at 200 kV/cm.
This work was supported by the National Natural Science Foundation of China (51572123); A Project Funded by the Priority Academic Program Development of Jiangsu Higher Education Institutions (PAPD). The authors would thank Professor Y. H. Lin and Dr. J. Ma of Tsinghua University for their helpful discussion.
- 9.S.H. Baek, J. Park, D.M. Kim, V.A. Aksyuk, R.R. Das, S.D. Bu, D.A. Felker, J. Lettieri, V. Vaithyanathan, S.S.N. Bharadwaja, N. Bassiri-Gharb, Y.B. Chen, H.P. Sun, C.M. Folkman, H.W. Jang, D.J. Kreft, S.K. Streiffer, R. Ramesh, X.Q. Pan, S. Trolier-McKinstry, D.G. Schlom, M.S. Rzchowski, R.H. Blick, C.B. Eom, Science 334, 958–961 (2011)CrossRefGoogle Scholar