Journal of Materials Science

, Volume 44, Issue 19, pp 5332–5338 | Cite as

A post-growth processing methodology to achieve barium strontium titanate thin films with low dielectric loss and high tunability for reconfigurable tunable devices

  • Melanie W. ColeEmail author
  • Adrian Podpirka
  • Shriram Ramanathan


Ba0.60Sr0.40TiO3 (BST) thin films, grown via RF-sputtering and the metalorganic solution deposition (MOSD) techniques, were post-growth annealed via conventional thermal annealing (CTA) and UV-photon irradiation annealing. With respect to the conventional thermal annealed films the UV-photon irradiation annealed films possessed improved structural properties and dielectric response. The optimization of the UV-photon irradiation annealing process parameters (using RF-sputtered BST films) was achieved via a detailed set of iso-thermal/chronal annealing experiments. The optimized UV-process parameters, applied to MOSD synthesized BST films revealed further enhanced dielectric response, i.e., 23% reduction in tan δ with sustained tunability of 42%. The improvements in the material properties of the UV-photon irradiation annealed BST thin films are attributed to stoichiometry and structural changes enabled through the UV-photon irradiation annealing process.


Barium Strontium Titanate Tunable Filter High Tunability Varactor Diode Barium Strontium Titanate Thin Film 


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Copyright information

© Springer Science+Business Media, LLC 2009

Authors and Affiliations

  • Melanie W. Cole
    • 1
    Email author
  • Adrian Podpirka
    • 2
  • Shriram Ramanathan
    • 2
  1. 1.U.S. Army Research LaboratoryWeapons and Materials Research DirectorateAberdeenUSA
  2. 2.School of Engineering and Applied SciencesHarvard UniversityCambridgeUSA

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