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Journal of Materials Science

, Volume 44, Issue 13, pp 3408–3412 | Cite as

Microstructure and mechanical properties of nanolayered W/W–C thin films

  • K. AbdelouahdiEmail author
  • C. Legrand-Buscema
  • P. Aubert
Article

Abstract

The present study reports on the mechanical and structural properties of W/W–C multilayered thin films with bilayer periods Λ ranging from 2.5 to 100 nm. Films were grown by reactive sputtering radio frequency on Si (100) substrate. X-ray diffraction (XRD), grazing incidence X-ray diffraction (GIXRD) and X-ray reflectivity were used to globally characterise the multilayers structure. Hardness and Young modulus have been determined using nanoindentation with a Berkovich tip. The XRD and the GIXRD diagrams revealed the presence of three phases: WC1−x randomly oriented, W2C with (100) preferred orientation and W with (110) preferred orientation. An increase in hardness is observed with decreasing period Λ, reaching a maximum value of ~26 GPa at Λ = 2.5 nm.

Keywords

Tungsten Carbide Tungsten Layer Bilayer Period Sputter Radio Frequency Period Thickness 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media, LLC 2009

Authors and Affiliations

  1. 1.Laboratoire d’étude des Milieux NanométriquesUniversité d’Evry Val d’EssonneEvry CedexFrance

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