Journal of Materials Science

, Volume 44, Issue 3, pp 855–860 | Cite as

Low-temperature sintering of ZrW2O8–SiO2 by spark plasma sintering

  • Kenji KanamoriEmail author
  • Tohru Kineri
  • Ryohei Fukuda
  • Takafumi Kawano
  • Keishi Nishio


Amorphous ZrW2O8 powder and amorphous SiO2 powder were prepared by a sol–gel process as raw materials, and high-density ZrW2O8–SiO2 were successfully prepared at a much lower temperature of 923 K for a much shorter holding time of 10 min by spark plasma sintering (SPS) method rather than by conventional melt-quenching method. The relative densities of 0.85ZrW2O8–0.15SiO2 and 0.70ZrW2O8–0.30SiO2 were 99.4% and 96.6%, respectively. The combined technique of a sol–gel process and SPS should enable us to prepare the varied types of high-density composites of ZrW2O8 without severe thermal cracking caused by melt-quenching. The thermal expansion properties and dielectric properties of ZrW2O8–SiO2 were also investigated.


SiO2 Spark Plasma Sinter Amorphous SiO2 Thermal Expansion Property Migration Loss 



The authors gratefully thank Mr. M. Hashimoto, Yamaguchi Prefectural Industrial Technology Institute, for helpful suggestions and numerous discussions.


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Copyright information

© Springer Science+Business Media, LLC 2008

Authors and Affiliations

  • Kenji Kanamori
    • 1
    Email author
  • Tohru Kineri
    • 2
  • Ryohei Fukuda
    • 3
  • Takafumi Kawano
    • 4
  • Keishi Nishio
    • 5
  1. 1.Graduate School of Science and EngineeringTokyo University of Science, YamaguchiSanyo-Onoda-shiJapan
  2. 2.Department of Materials Science and Environmental EngineeringTokyo University of Science, YamaguchiSanyo-Onoda-shiJapan
  3. 3.Enhanced Ceramics Substrate DepartmentSumitomo Metal (SMI) Electronics Devices Inc.Mine-shiJapan
  4. 4.Inorganic Specialty Products Research LaboratoryUbe Industries, Ltd.Ube-shiJapan
  5. 5.Department of Materials Science and TechnologyTokyo University of ScienceNoda-shiJapan

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