Journal of Materials Science

, Volume 43, Issue 6, pp 1818–1824 | Cite as

Transient bleaching pulse shapes in electrochromic polysiloxane thin films

  • David Mitchell GoldieEmail author


Transient bleaching currents are examined for a series of electrochromic carbazole-modified polysiloxane thin films. The shape of the bleaching currents is found to be sensitive to the type of counter-ion employed and the initial density of counter-ion charge that is deposited in the films during the colouration stage. Pure space-charge-limited (SCL) transport of counter-ions that posses a well-defined mobility is inconsistent with the observed pulse shapes and a modified SCL model that involves fast and slow mobility sites is proposed. The modified SCL model may describe a variety of transient bleaching pulse shapes (including current overshoots) as charge is removed from the electrochromic films and the counter-ions are constrained to transfer from slow to fast discharge sites.


Tungsten Trioxide Neutral Plasma Bleach Time Tetrabutylammonium Tetrafluoroborate Fast Site 


  1. 1.
    Somani PR, Radhakrishnan S (2003) Mater Chem Phys 77:117CrossRefGoogle Scholar
  2. 2.
    Lampert CM (2002) Glass Sci Technol 75:244Google Scholar
  3. 3.
    Rosseinsky DR, Mortimer RJ (2001) Adv Mater 13:783CrossRefGoogle Scholar
  4. 4.
    Vondrak J, Sedlarikova M, Vlcek M, Mohelnikova K, Macalik M (2006) Mech Syst Mater Solid State Phenom 113:507CrossRefGoogle Scholar
  5. 5.
    Lee ES, DiBartolomeo DL (2002) Solar Mater Solar Cells 71:465CrossRefGoogle Scholar
  6. 6.
    Faughnan BW, Crandall RS (1980) Top Appl Phys 40:181CrossRefGoogle Scholar
  7. 7.
    Monk PMS (1999) Crit Rev Solid State Mater Sci 24:193CrossRefGoogle Scholar
  8. 8.
    Faughnan BW, Crandall RS, Lampert MA (1975) Appl Phys Lett 27:275CrossRefGoogle Scholar
  9. 9.
    Crandall RS, Faughnan BW (1976) Appl Phys Lett 28:95CrossRefGoogle Scholar
  10. 10.
    Mortimer RJ, Dyer AL, Reynolds JR (2006) Displays 27:2CrossRefGoogle Scholar
  11. 11.
    Sonmez G (2005) Chem Commun 42:5251CrossRefGoogle Scholar
  12. 12.
    Maud JM, Booth TW, Hepburn AR, Marshall JM (1990) In: Borissov M, Kirov H, Marshall JM, Vavrek A (eds) Proceddings of the 6th ISCMP. World Scientific, p 294Google Scholar
  13. 13.
    Goldie DM, Hepburn AR, Maud JM, Marshall JM (1993) Mol Cryst Liq Cryst 236:87CrossRefGoogle Scholar
  14. 14.
    Hepburn AR, Goldie DM (1994) J Mater Sci Mater Electron 5:94Google Scholar
  15. 15.
    Bartlett ID, Hepburn AR (1995) Synth Met 70:1241CrossRefGoogle Scholar
  16. 16.
    Bartlett ID, Marshall JM, Maud JM (1996) J Non-Cryst Solid 200:665CrossRefGoogle Scholar
  17. 17.
    Lampert MA, Mark P (1970) Current injection in solids. Academic Press, New YorkGoogle Scholar
  18. 18.
    Mayer L, Melzer C, Barzoukas M, Fort A, Mery S, Nicoud JS (1997) Appl Phys Lett 71:2248CrossRefGoogle Scholar
  19. 19.
    Street RA (1991) Hydrogenated amorphous silicon. Cambridge University Press, CambridgeCrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media, LLC 2008

Authors and Affiliations

  1. 1.Division of Electronic Engineering and PhysicsUniversity of DundeeDundeeScotland

Personalised recommendations