Characterization of ZnO-Cu2O crystal films by electrochemical codeposition
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Codeposition of mixed ZnO and Cu2O (ZnO-Cu2O) crystal films using electrochemical deposition (ECD) was investigated. The ZnO-Cu2O films were prepared using different ratios of Zn2+ and Cu2+ in precursor solutions and at various ECD periods and potential settings. The properties of the ECD films, such as crystal composition, morphology, and light absorption, were analyzed. Results showed that the properties of the fabricated films were affected by the potential setting, metal ion ratio, and deposition period in the ECD process. The potential required to fabricate ZnO film was lowered negatively from − 1 V without Cu2+ to − 0.4 V with the presence of Cu2+ in the ECD solution. The presence of Cu2+ was determined to be the major factor affecting the shape of ZnO particles formed, which varied from rod-like to spherical. The crystal composition of the ECD films involved Cu2O and Cu without ZnO using a low ratio of Zn2+ in the precursor at − 0.4 V. ZnO and Cu2O crystals appeared in the film at − 0.4 V with a high ratio of Zn2+ in the precursor. The composition of ZnO, Cu2O, and Cu in the ECD films was the major factor to influence the light absorption patterns of the films. The codeposition steps of ZnO-Cu2O films were elucidated from the results.
KeywordsZnO/Cu2O film Electrochemical deposition Light absorption Metal ion ratio Deposition period
This work is partially supported by the Ministry of Science and Technology, Taiwan, R.O.C. under Grant MOST 106-2221-E-155-047.
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