Structure, microstructure and magnetic properties of pulse electrodeposited CoFe–Cu granular thin films
In this paper, we have investigated structural and magnetic properties of CoFe–Cu granular thin films as a function of ferromagnetic layer pulse time (tCoFe). These films were electrodeposited on Au-coated Si substrate from an aqueous solution containing boric acid and ascorbic acid as additives. Deposition potential for Cu layer was − 0.5 V and − 0.9 V for CoFe layer with respect to (AgCl/Ag) electrode. EDX analysis has shown that ferromagnetic material concentration increases with increase in ferromagnetic layer pulse time (tCoFe). The presence of (110) (200) (211) (311) and (220) XRD reflections observed at 2θ ~ 45°, 52°, 83°, 93°, and 99° indicate that these films have mixture of body-centered cubic and face-centered cubic structure. Magnetic measurements revealed that the easy axis of magnetization lies along the in-plane direction. Magnetic properties of granular films are explained by considering the changes in the elemental composition, deposition time, dynamics of the surface roughness, and anisotropy.
Shivani Agarwal acknowledges financial support by IFW, Dresden. She is grateful to Prof. K. Neilsch and Dr. Heike Schloerb to accept her as a research visitor to perform the experiments and stay at IFW Dresden. She is thankful to Dr. Diana Pohl to supervise her during stay there.
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