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Pulsed laser deposition—UV laser sources and applications

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Abstract

Progress in material research and processing industry is fueled by the technique of pulsed laser deposition (PLD).

High energy excimer lasers enable this technique since every material is amenable to their high photon energies. Spectral properties, temporal pulse and laser beam parameters of state of the art excimer lasers will be compared with frequency converted Nd:YAG lasers.

Both quality and longevity of the deposited layers strongly depend on the degree of accuracy achieved in the thin film ablation and subsequent deposition process.

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Authors and Affiliations

  1. Coherent GmbH, Hans-Böckler-Str. 12, 37079, Göttingen, Germany

    R. Delmdahl & R. Pätzel

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  1. R. Delmdahl
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  2. R. Pätzel
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Correspondence to R. Delmdahl.

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Delmdahl, R., Pätzel, R. Pulsed laser deposition—UV laser sources and applications. Appl. Phys. A 93, 611–615 (2008). https://doi.org/10.1007/s00339-008-4716-7

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  • DOI: https://doi.org/10.1007/s00339-008-4716-7

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