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Polarization-dependent contrast of near-field and far-field-propagating signal intensities in C-mode scanning near-field optical microscopy/photon scanning tunneling microscopy

Abstract

A recent paper by Nayaet al. (Opt. Commun.124 (1996) 9) presented high-resolution imaging results obtained in the sub-100-nm range with a collection-mode near-field optical microscope. The images exhibit apparent polarization dependence. A simple modeling and calculation based on the experiment, using a semi-microscopic and perturbative approach, showed that the far-field-propagating signal intensity converted from the near-field can qualitatively explain the polarization dependence of the experiment if the taper angle of the probe tip is taken into account.

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Author information

Correspondence to Kiyoshi Kobayashi or Osaaki Watanuki.

Additional information

This paper was originally presented at the first Asia-Pacific Workshop on Near Field Optics, which was held on August 17 and 18, 1996 at Seoul Education and Culture Center, Seoul, Korea, organized by Condensed Mattter Research Institute, Seoul National University.

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Kobayashi, K., Watanuki, O. Polarization-dependent contrast of near-field and far-field-propagating signal intensities in C-mode scanning near-field optical microscopy/photon scanning tunneling microscopy. Optical Review 3, A447 (1996). https://doi.org/10.1007/BF02935956

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Key words

  • near-field optics
  • SNOM
  • photon STM
  • polarization
  • contrast
  • taper angle
  • modeling
  • simulation