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Moisture-resistance of SiO2 films

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Literature cited

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    W. A. Pliskin, Proc. IEEE,52, No. 12, 1468–1471 (1964).

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    W. A. Pliskin, D. R. Kerr, and J. A. Perri, Physics of Thin Films [Russian translation], Mir, Moscow (1970).

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    N. I. Timofeeva, L. I. Drozdova, and V. A. Timofeev, Izv. Akad. Nauk SSSR, Ser. Neorgan. Mater.,6, 3 (1970).

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    G. A. Vorob'ev and T. I. Danilina, Izv. VUZ. Fiz., No. 6, 158–159 (1970).

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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 7, pp. 125–127, July, 1972.

In conclusion, the authors wish to thank Professor G. A. Vorob'ev for his constant interest in the work and his valuable comments on the manuscript.

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Danilina, T.I., Motoshkin, V.V., Vedernikov, V.A. et al. Moisture-resistance of SiO2 films. Soviet Physics Journal 15, 1034–1035 (1972). https://doi.org/10.1007/BF00894695

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Keywords

  • SiO2
  • SiO2 Film