A mathematical model is presented for cyclic heat treatment of a film on a substrate, and heating curves have been constructed for a thin silicon wafer heated by an infrared source and cooled by forced convection.
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Translated from Inzhenerno-Fizicheskii Zhurnal, Vol. 28, No. 2, pp. 323–328, February, 1975.
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Vasil'ev, G.K., Makarov, N.I. & Prokhorov, Y.I. Cyclic heating of a film on a substrate. Journal of Engineering Physics 28, 227–231 (1975). https://doi.org/10.1007/BF00865847
- Mathematical Model
- Heat Treatment
- Statistical Physic