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Theoretical approach to chemical vapour deposition in the atomic system Ti-Si-C-CI-H

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Touanen, M., Teyssandier, F. & Ducarroir, M. Theoretical approach to chemical vapour deposition in the atomic system Ti-Si-C-CI-H. J Mater Sci Lett 8, 98–101 (1989). https://doi.org/10.1007/BF00720264

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Keywords

  • Polymer
  • Chemical Vapour Deposition
  • Vapour Deposition
  • Chemical Vapour
  • Theoretical Approach