Morphology and structure of tantalum oxide deposit prepared by KrF excimer laser CVD
- 52 Downloads
Tantalum oxide films have been deposited on substrates by decomposing Ta(OCH3)5 photolytically in the beam of a KrF excimer laser under various conditions of laser fluence (200–450 J m−2), repetition rate (20–120 Hz), supply rate of Ta(OCH3)5 (50–400 mg h−1) and substrate temperature (403–723 K). The deposits were highly oriented when produced at laser fluences of 350 and 450 J m−2. Their XRD patterns suggested the formation of β-Ta2O5. The (1 1 1 0) planes were preferentially oriented parallel to the substrate surface when produced at lower repetition rates, higher supply rates of Ta(OCH3)5, and lower substrate temperatures; whereas (1 1 1 1) planes were similarly oriented when the conditions were reversed. The preferred orientation may be explained in terms of supersaturation. The deposits produced at a fluence of 200 J m−2 were, however, rather amorphous.
KeywordsRepetition Rate Substrate Temperature Oxide Film Tantalum Substrate Surface
Unable to display preview. Download preview PDF.
- 6.Y. Imai, S. Mizuta andH. Nakauchi,Boshoku Gijutsu 35 (1986) 230.Google Scholar
- 11.M. Okada, H. Fukaya andT. Ido,Denki Kagaku 53 (1985) 109.Google Scholar
- 17.Y. Imai, A. Watanabe, K. Osato, T. Kameyama andK. Fukuda,Chem. Lett. (1990) 177.Google Scholar
- 22.R. D. Gretz, in “Vapor deposition”, edited by C. F. Powell, J. H. Oxley and J. M. Blocher, Jr (John Wiley and Sons, New York, 1966) p.149.Google Scholar