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Journal of Materials Science

, Volume 28, Issue 19, pp 5363–5368 | Cite as

Morphology and structure of tantalum oxide deposit prepared by KrF excimer laser CVD

  • A. Watanabe
  • M. Mukaida
  • Y. Imai
  • K. Osato
  • T. Kameyama
  • K. Fukuda
Papers

Abstract

Tantalum oxide films have been deposited on substrates by decomposing Ta(OCH3)5 photolytically in the beam of a KrF excimer laser under various conditions of laser fluence (200–450 J m−2), repetition rate (20–120 Hz), supply rate of Ta(OCH3)5 (50–400 mg h−1) and substrate temperature (403–723 K). The deposits were highly oriented when produced at laser fluences of 350 and 450 J m−2. Their XRD patterns suggested the formation of β-Ta2O5. The (1 1 1 0) planes were preferentially oriented parallel to the substrate surface when produced at lower repetition rates, higher supply rates of Ta(OCH3)5, and lower substrate temperatures; whereas (1 1 1 1) planes were similarly oriented when the conditions were reversed. The preferred orientation may be explained in terms of supersaturation. The deposits produced at a fluence of 200 J m−2 were, however, rather amorphous.

Keywords

Repetition Rate Substrate Temperature Oxide Film Tantalum Substrate Surface 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman & Hall 1993

Authors and Affiliations

  • A. Watanabe
    • 1
  • M. Mukaida
    • 1
  • Y. Imai
    • 1
  • K. Osato
    • 1
  • T. Kameyama
    • 1
  • K. Fukuda
    • 1
  1. 1.Department of Inorganic MaterialsNational Institute of Materials and Chemical ResearchIbarakiJapan

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