Nickel thin films prepared by chemical vapour deposition from nickel acetylacetonate
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Nickel thin films were prepared by a low-temperature atmospheric-pressure chemical vapour deposition method. The raw material was nickel acetylacetonate. At a reaction temperature above 250 °C, polycrystalline nickel films can be obtained by hydrogen reduction of the raw material. The resistivity (8.1–13.3 μΩ cm) of the film was close to that of bulk nickel.
KeywordsHydrogen Polymer Nickel Thin Film Reaction Temperature
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