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Journal of Materials Science

, Volume 26, Issue 5, pp 1287–1294 | Cite as

Mechanical properties of SiNxCx ceramic films prepared by plasma CVD

  • M. Moriyama
  • K. Kamata
  • I. Tanabe
Papers

Abstract

The mechanical properties of Si3N4-SiC, SiNx and SiCy films prepared at a low temperature of 400 °C by plasma chemical vapour deposition are reported. Microhardness, internal stress of the film and adhesive strength between the film and glass or stainless steel substrate were evaluated as principal mechanical properties. Microhardness was measured to be about 10 to 20 G Pa dependent on the film composition in each system. Internal stress of the films on borosilicate glass substrates extensively varied from tensile to compressive with the film composition change from Si3N4 to SiC. Adhesive strength, as ascertained by the scratch test, was about 580 to 800 MPa for crown glass substrates, and about 210 to 310 M Pa for 316 stainless steel substrates. It is pointed out that tensile stress in these films brought about more abrupt decreases of the adhesive strength than did compressive stress.

Keywords

Tensile Stress Compressive Stress Chemical Vapour Deposition Glass Substrate Internal Stress 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    H. M. Jennings, J. Mater. Sci. 18 (1983) 951.CrossRefGoogle Scholar
  2. 2.
    F. F. Lange and T. K. Gupta, J. Amer. Ceram. Soc. 59 (1976) 537.CrossRefGoogle Scholar
  3. 3.
    F. F. Lange, J. Mater. Sci. 10 (1975) 314.CrossRefGoogle Scholar
  4. 4.
    K. Niihara and T. Hirai, ibid. 11 (1976) 593.CrossRefGoogle Scholar
  5. 5.
    J. Chin, P. K. Gantzel and R. G. Hudson, Thin Solid Films 40 (1977) 57.CrossRefGoogle Scholar
  6. 6.
    K. Kamata, Y. Maeda and M. Moriyama, J. Mater. Sci. Lett. 5 (1986) 1051.CrossRefGoogle Scholar
  7. 7.
    K. Kamata, Y. Maeda, K. Yasui and M. Moriyama, Yogyo-Kyokai-Shi 94 (1986) 12 (in Japanese).Google Scholar
  8. 8.
    K. Kamata, N. Aizawa and M. Moriyama, J. Mater. Sci. Lett. 5 (1986) 1055.CrossRefGoogle Scholar
  9. 9.
    K. Kamata, N. Aizawa, Y. Maeda and M. Moriyama, in “Proceedings of the World Congress on High Tech Ceramics” Milan, June 1986, edited by P. Vincenzini (Elsevier Science, Amsterdam, 1987) Part C, p. 2649.Google Scholar
  10. 10.
    M. Moriyama and K. Kamata, J. Mater. Sci. Lett. 6 (1987) 1141.CrossRefGoogle Scholar
  11. 11.
    P. Benjamin and C. Weaver, Proc. Roy. Soc. A254 (1960) 163.Google Scholar
  12. 12.
    J. W. Edington, D. J. Rowcliffe and J. L. Henshall, Powder Metall. Int. 7 (1975) 82.Google Scholar
  13. 13.
    T. Goto and T. Hirai, J. Mater. Sci. 18 (1983), 3387.CrossRefGoogle Scholar
  14. 14.
    A. K. Sinha, H. J. Levinstein, T. E. Smith, G. Quintana and S. E. Haszko, J. Electrochem. Soc. 125 (1978) 601.CrossRefGoogle Scholar
  15. 15.
    D. S. Williams, J. Appl. Phys. 57 (1985) 2340.CrossRefGoogle Scholar
  16. 16.
    W. Kern and R. S. Rosler, J. Vac. Sci. Technol. 14 (1977) 1082.CrossRefGoogle Scholar
  17. 17.
    M. Moriyama, K. Kamata and I. Tanabe, unpublished data, private communication, 1986.Google Scholar
  18. 18.
    K. Niihara and T. Hirai, J. Mater. Sci. 12 (1977) 1243.CrossRefGoogle Scholar
  19. 19.
    G. G. Deeley, J. M., Herbert and N. C. Moore, Powder Metall. 8 (1961) 145.CrossRefGoogle Scholar
  20. 20.
    M. Abe, M. Kawai, T. Kanno and K. Suzuki, in “Engineering Ceramics” (Gihoudou, Tokyo, 1984) p. 20 (in Japanese).Google Scholar
  21. 21.
    K. Niihara, J. Amer. Ceram. Bull 63 (1984) 1160.Google Scholar
  22. 22.
    K. Wasa, T. Nagai and S. Hayakawa, Thin Solid Films 31 (1976) 235.CrossRefGoogle Scholar
  23. 23.
    H. Yoshihara, H. Mori and M. Kiuchi, ibid. 76 (1981) 1.CrossRefGoogle Scholar
  24. 24.
    S. Dutta, R. W. Rice, H. C. Graham and M. C. Mendiratta, J. Mater. Sci. 15 (1980) 2183.CrossRefGoogle Scholar
  25. 25.
    H. Suzuki, H. Matsubara, A. Matsuo and K. Shibuki, Funtai oyobi Funmatsu-Yakin (J. Jpn Soc. Powder and Powder Metall. 32 (1985) 270 (in Japanese).CrossRefGoogle Scholar
  26. 26.
    Y. Doi, A. Doi, M. Tobioka and A. Ikegaya, ibid. 33 (1986) 413 (in Japanese).CrossRefGoogle Scholar
  27. 27.
    K. Kamata, N. Saito, N. Hayashi, I. Tanabe and M. Moriyama, J. Ceram. Soc. of Jpn 98 (1990) 156 (in Japanese).CrossRefGoogle Scholar

Copyright information

© Chapman and Hall Ltd. 1991

Authors and Affiliations

  • M. Moriyama
    • 1
  • K. Kamata
    • 2
  • I. Tanabe
    • 2
  1. 1.Nagano National College of TechnologyNagano CityJapan
  2. 2.Nagaoka University of TechnologyNagaoka CityJapan

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